Heinrich Kirchauer
= Heinrich Kirchauer
{c}
<Heinrich Kirchauer> authored a dissertation treatment of <photolithography> that explains <photoresist contrast> through the exposure-response curve. The account relates <photoresist> thickness after development to exposure dose, separating the onset of clearing from complete removal. This makes contrast a measurable process characteristic rather than simply visual darkness.<Contrast and Important Properties by Heinrich Kirchauer>[§2.6.1]{ref}