Litho-etch-litho-etch double patterning (source code)

= Litho-etch-litho-etch double patterning

= LELE double patterning
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A sequence that exposes and transfers one sparse pattern, then applies fresh resist and transfers a second aligned pattern. Their union defines a denser final mask or etched layer. Pattern transfer between exposures prevents simple addition of optical dose from replacing two independently resolved exposures.