= Physics of Microfabrication: Front End Processing, Lecture 20 by Massachusetts Institute of Technology
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{tag=Work by Massachusetts Institute of Technology}
MIT 6.774, Fall 2004, institutional lecture transcript. The discussion distinguishes largely chemical <photoresist> ashing in barrel/plasma systems from more strongly directional <reactive-ion etching>. The source is a teaching lecture, not an experimental paper.
https://ocw.mit.edu/courses/6-774-physics-of-microfabrication-front-end-processing-fall-2004/1qv-RkuGGz7mFmOaR3Kq1JxAKb6ThWhhd_transcript.pdf
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