= Chemical vapor deposition of ruthenium
{wiki=Chemical_vapor_deposition_of_ruthenium}
Chemical vapor deposition (CVD) of ruthenium is a process used to deposit ruthenium thin films onto substrates. This technique is important in various fields, including electronics, materials science, and nanotechnology, where the precise control of film thickness and morphology is essential. \#\#\# Process Overview 1. **Precursor Selection**: The process begins with the selection of appropriate ruthenium precursors.
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