= Inverse lithography
{wiki=Inverse_lithography}
Inverse lithography, often referred to in the context of optical lithography, is a computational approach used in the design and fabrication of photomasks for semiconductor manufacturing. The main goal of inverse lithography is to achieve high-resolution patterning on semiconductor wafers, which is critical for the production of integrated circuits. The process typically involves the following steps: 1. **Pattern Specification**: The desired pattern for the semiconductor device is defined.
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