= Thermal laser epitaxy
{wiki=Thermal_laser_epitaxy}
Thermal laser epitaxy (TLE) is a specialized growth technique used in materials science and semiconductor fabrication to create thin films or heterostructures with precise control over their composition and structure. The method typically involves the use of a focused laser beam to locally heat a substrate or a precursor material, thereby enabling the growth of crystalline films on the substrate based on thermally induced reactions.
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