Ion beam deposition

Ion beam deposition (IBD) is a physical vapor deposition (PVD) technique used to deposit thin films of materials onto substrates. It involves the use of a focused beam of ions—typically generated by an ion source—that is directed at a target material. The key steps of the process are as follows: 1. **Ion Generation**: Ions are generated from a gas (often noble gases like argon) using an ion source, which creates a plasma of charged particles.