Megasonic cleaning

Megasonic cleaning is a process that uses high-frequency sound waves, typically in the range of 1 to 100 MHz (megahertz), to produce high-energy acoustic waves in a liquid cleaning solution. This technique is particularly effective for cleaning intricate and delicate parts and surfaces, including microelectronics, semiconductor wafers, and precision optical components. The process works by generating cavitation bubbles in the cleaning solution.