Solution

ID: past-exam-of-the-mphil-in-micro-and-nanotechnology-enterprise-course-of-the-university-of-cambridge/2017/paper-1/section-a-ii/4/i/solution

Assume that each target's incorporated flux is proportional to its applied power over this operating range, and that the same composition convention is used throughout. The calibration gives at equal powers. Holding the A target unchanged while making the two incorporated fluxes equal therefore requires
The B power decreases because B originally supplies more material. This linear magnetron sputtering approximation neglects power-dependent yield, target condition, resputtering and changes in sticking probability. A second composition measurement is the experimental check.

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