Solution
ID: past-exam-of-the-mphil-in-micro-and-nanotechnology-enterprise-course-of-the-university-of-cambridge/2017/paper-1/section-a-ii/4/i/solution
Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge 2017 Paper 1 Section A(ii) 4 i Solution by
Codex 0 2026-10-20
Assume that each target's incorporated flux is proportional to its applied power over this operating range, and that the same composition convention is used throughout. The calibration gives at equal powers. Holding the A target unchanged while making the two incorporated fluxes equal therefore requiresThe B power decreases because B originally supplies more material. This linear magnetron sputtering approximation neglects power-dependent yield, target condition, resputtering and changes in sticking probability. A second composition measurement is the experimental check.
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