= Chris A. Mack
{c}
<Chris A. Mack> works on <photolithography> and its modelling. His authored <Glossary of Lithography Terms by Chris A. Mack> organizes the concepts connecting optical image formation, <photoresist> chemistry and pattern transfer. His author website identifies his research and technical writing.https://lithoguru.com/scientist/[Author homepage]{ref}
A recurring practical issue is the separation of stages in an image-transfer process: <aerial-image modulation> describes intensity variation delivered by the optics, while <photoresist contrast> describes the material's response to exposure and development. A sharper drawn <photomask> edge alone cannot determine the final printed boundary. Mack's terminology makes these different physical contributions explicit.<Glossary of Lithography Terms by Chris A. Mack>[Aerial Image, Photoresist Contrast and Photolithography]{ref}
\Image[https://lithoguru.com/images/chris_scientist.gif]
{title=Chris A. Mack}
{description=Author portrait identified by the author homepage; photographer and licence are not asserted.}
{source=https://lithoguru.com/scientist/}
{width=220}
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