Chris A. Mack works on photolithography and its modelling. His authored Glossary of Lithography Terms by Chris A. Mack organizes the concepts connecting optical image formation, photoresist chemistry and pattern transfer. His author website identifies his research and technical writing.[ref]
A recurring practical issue is the separation of stages in an image-transfer process: aerial-image modulation describes intensity variation delivered by the optics, while photoresist contrast describes the material's response to exposure and development. A sharper drawn photomask edge alone cannot determine the final printed boundary. Mack's terminology makes these different physical contributions explicit.[ref]
Figure 1.
Chris A. Mack
. Author portrait identified by the author homepage; photographer and licence are not asserted. Source.

Ancestors (5)

  1. List of chemical engineers
  2. Chemical engineer
  3. Chemical engineering
  4. Engineering
  5. Home

Incoming links (1)

View article source

Discussion (0) New discussion

There are no discussions about this article yet.

Articles by others on the same topic (0)

There are currently no matching articles.
See all articles in the same topic Create my own version