= Stress imaging of Si microfabricated structures by HORIBA
https://www.horiba.com/ind/materials/material-types/raw-materials-for-semiconductors/stress-analysis-for-semiconductor-raw-materials/stress-imaging-of-si-microfabricated-structures/
Official manufacturer application documentation. Section Stress distribution analysis using Raman images illustrates stress mapping in shallow trenches near the active-zone edge of microfabricated silicon and discusses a linear correlation between applied silicon stress and Raman peak shift. This is a material-specific measurement application, not a universal conversion from Raman shift to an isolated bond force constant. No personal byline or publication date is asserted.
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