= Yujin Jang
{c}
<Yujin Jang> investigated direct <atomic layer deposition> of <molybdenum> disulfide thin films on oxide-covered wafers. Self-limited exposure behaviour connects the deposition chemistry with thickness control, while the reported nanocrystalline microstructure describes the material actually obtained.<Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition by Yujin Jang and others>[2016, Applied Surface Science study: exposure saturation and nanocrystalline MoS2]{ref}
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