Yujin Jang investigated direct atomic layer deposition of molybdenum disulfide thin films on oxide-covered wafers. Self-limited exposure behaviour connects the deposition chemistry with thickness control, while the reported nanocrystalline microstructure describes the material actually obtained.[ref]
Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition by Yujin Jang and others. 2016, Applied Surface Science study: exposure saturation and nanocrystalline MoS2
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