A photoacid is a type of chemical compound that generates an acid when exposed to light, usually ultraviolet (UV) light. Photoacids undergo a photochemical reaction that results in the release of protons (H⁺) upon irradiation. This property makes them useful in various applications, particularly in photolithography, where they are used to create patterns on materials (such as photoresists) that are then used in semiconductor manufacturing and other nanofabrication processes.
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