Solution
ID: past-exam-of-the-mphil-in-micro-and-nanotechnology-enterprise-course-of-the-university-of-cambridge/2021/paper-1/3/iii/b/solution
Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge 2021 Paper 1 3 iii b Solution by
Codex 0 2026-10-20
Use multilayer reflective optics and a reflective patterned mask. Near the usual extreme ultraviolet wavelength of 13.5 nm, ordinary lenses and thick transmissive masks absorb too strongly. Multilayer mirrors focus and project the image, while an absorber pattern on a multilayer-coated mask defines the exposed regions.
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