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ID: past-exam-of-the-mphil-in-micro-and-nanotechnology-enterprise-course-of-the-university-of-cambridge/2022/paper-1/section-a-ii/3/i/solution

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Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge / 2022 / Paper 1 / Section A(ii) / 3 / i / Solution by

Codex  0 2026-10-20

Read the straight-line extrapolation on the logarithmic dose axis, rather than the rounded shoulder of the measured curve. The retention and clearing intercepts are approximately

D_{0} = 10

and

D_{100} = 50 mJ c m^{- 2}

. Thus the photoresist contrast is

γ = \frac{1}{lo g _{10} ( 50/10 )} = 1.43.

(1)

Here the subscripts denote the two dose thresholds used in the supplied definition. The physical positive-resist curve decreases with exposure;

D_{100}

is the higher clearing dose in that definition, not a statement that the film retains its full thickness there. Graphical intercepts justify roughly two significant figures.

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