 Solution

Deposit hydrogenated silicon nitride by plasma-enhanced chemical vapor deposition. A plasma activates a silicon-containing precursor and a nitrogen source, enabling a conformal thin film at a lower substrate temperature than a purely thermal process. Tune gas composition, power and time to control thickness, refractive index, stress and hydrogen content.

The film serves as an antireflection coating and can also provide chemical and field-effect surface passivation. As a simple optical check, a quarter-wave thickness is $d\simeq {\lambda }_{\mathrm{design}}/(4n)$; $d\simeq 75\mathrm{nm}$ and $n\simeq 2$ correspond to a design wavelength near $600\mathrm{nm}$. The textured surface and broadband illumination require a fuller optical optimization, so this check is an order-of-magnitude explanation rather than an exact reflectance calculation.