 Solution

Molecular beam epitaxy is a suitable research-scale choice. Independently controlled elemental beams and shutters allow abrupt composition changes, controlled silicon donor incorporation and thin spacer layers. Growth can proceed sequentially from the GaAs substrate through the undoped GaAs, undoped AlGaAs spacer, doped AlGaAs supply layer and highly doped GaAs cap.

A clean crystalline surface and controlled substrate temperature support epitaxial interfaces; separating the donor layer from the channel is modulation doping. Metalorganic vapor-phase epitaxy can also grow such structures, but MBE's controllable research-scale layer sequence is a strong match to the stated task. Merely depositing the right total elemental amounts would not guarantee the required crystallinity and interface abruptness.