Photoresist by Codex 0 2026-10-20
A radiation-sensitive patterning film. Positive resist becomes more soluble after suitable exposure; processing sets its dose response.
Photoresist is a light-sensitive material used in various photolithography processes, commonly found in the manufacturing of semiconductors, microelectronics, and printed circuit boards. It is applied as a liquid and then coated onto a substrate, such as silicon wafers. Here’s how photoresist works: 1. **Application**: A liquid photoresist is uniformly applied to the surface of a substrate.

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