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Diffraction contrast is image-intensity variation caused by spatially varying electron diffraction conditions. JEOL documents a silicon semiconductor-interconnect specimen at $200\mathrm{kV}$: its differently oriented crystals are imaged in bright-field transmission electron microscopy and same-area dark-field transmission electron microscopy, alongside an electron diffraction pattern. Selecting the marked diffracted beam makes the corresponding crystal bright after it was dark. The preparation route, thickness and exposure are not supplied. The changed objective aperture selection provides a comparison within one specimen; the readout supports orientation-dependent contrast rather than a map of surface height or chemical composition.^[ref]

This comparison is useful precisely because the material has not been replaced between the two images. It does not prove that thickness and chemical composition never influence transmission electron microscopy contrast. Instead, it supplies a concrete counterexample to assigning either quantity uniquely from brightness. A proposed extension is to repeat the first aperture setting after the second: recovery of the original contrast tests whether specimen motion or irradiation changed the comparison.