Photolith film is a type of photosensitive material used primarily in the process of photolithography, which is a critical step in the manufacturing of semiconductor devices, printed circuit boards, and various microelectronic components. In photolithography, the photolith film is coated onto a substrate (such as silicon wafers) and then exposed to ultraviolet (UV) light through a mask that defines the desired pattern. The exposed areas of the film undergo a chemical change, allowing for selective development.
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