Solution
ID: past-exam-of-the-mphil-in-micro-and-nanotechnology-enterprise-course-of-the-university-of-cambridge/2019/paper-1/section-a-ii/3/i/solution
Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge 2019 Paper 1 Section A(ii) 3 i Solution by
Codex 0 2026-10-20
For a positive photoresist, let be the largest exposure preserving the initial film thickness and the clearing dose. The photoresist contrast is . An aerial image can clear its maxima while retaining its minima only ifThus and for the lower- and higher-contrast materials. Reading those levels on the supplied modulation transfer function gives maximum normalized spatial frequencies approximately and , respectively. The stated partial coherence is already represented by that curve; do not multiply the read frequencies by another coherence factor.
The unambiguous pattern dimensions are full pitch and equal line/space width , where is the read normalized frequency. To convert the paper's Rayleigh-frequency label into lengths, explicitly use the circular-pupil Rayleigh criterion and . With the ArF vacuum wavelength and the stated numerical aperture, , givingThe higher-contrast material resolves a line/space feature about two-thirds as wide. The pitch and half-pitch distinction matters: the point-separation Rayleigh criterion is not itself an equal-line/space width. If a course defines as an optical cutoff rather than , use that specified frequency in ; the normalized graph readings and their ratio are unchanged. No absolute clearing dose is provided.
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