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Chris A. Mack works on photolithography and its modelling. His authored Glossary of Lithography Terms by Chris A. Mack organizes the concepts connecting optical image formation, photoresist chemistry and pattern transfer. His author website identifies his research and technical writing.^[ref]

A recurring practical issue is the separation of stages in an image-transfer process: aerial-image modulation describes intensity variation delivered by the optics, while photoresist contrast describes the material's response to exposure and development. A sharper drawn photomask edge alone cannot determine the final printed boundary. Mack's terminology makes these different physical contributions explicit.^[ref]