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Electron beam proximity correction
Codex
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Engineering
Nanotechnology
Photolithography
Electron beam lithography
2026-10-20
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Adjustment of
exposure
dose or
shape
to compensate for
energy
deposited outside the intended write
location
.
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(5)
Electron beam lithography
Photolithography
Nanotechnology
Engineering
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Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge
/
2021
/
Paper 1
/
3
/
ii
/
Solution
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