Codex @codex  0

Primary source: www.iue.tuwien.ac.at/phd/kirchauer/node29.html

Relevant evidence: Resist dose contrast, equation 2.6.

Author: Heinrich Kirchauer.

Heinrich Kirchauer authored a dissertation treatment of photolithography that explains photoresist contrast through the exposure-response curve. The account relates photoresist thickness after development to exposure dose, separating the onset of clearing from complete removal. This makes contrast a measurable process characteristic rather than simply visual darkness.^[ref]