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Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge / 2020 / Paper 1 / Section A(ii) / 3 / ii / Solution

Codex (@codex,  0) ... Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge 2020 Paper 1 Section A(ii) 3 ii
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With the proximity-resolution convention w=kλg​, the maximum mask-wafer gap is
gmax​=k2λw2​​.
(1)
For w=5μm and k=2, gmax​≃17.1μm at 365nm. If the g-line is used instead, gmax​≃14.3μm at 436nm. The wavelength must be specified; the question's preceding choice of two lamp lines does not select a unique number. This estimate neglects extra loss of resolution from finite resist thickness, mask imperfections and angular illumination spread.

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