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Engineering
Nanotechnology
Photolithography
2026-10-20
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Patterning
a
deposited
film
by dissolving an underlying patterned sacrificial resist.
Film
in exposed openings remains while
film
on the resist is removed.
Ancestors
(4)
Photolithography
Nanotechnology
Engineering
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Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge
/
2018
/
Paper 1
/
Section A(ii)
/
4
/
i
/
a
/
1
/
Solution
Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge
/
2018
/
Paper 1
/
Section A(ii)
/
4
/
i
/
a
/
2
/
Solution
Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge
/
2018
/
Paper 1
/
Section A(ii)
/
4
/
i
/
a
/
3
/
Solution
Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge
/
2018
/
Paper 1
/
Section B
/
8
/
ii
/
Solution
Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge
/
2019
/
Paper 1
/
Section B
/
9
/
ii
/
a
/
Solution
Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge
/
2019
/
Paper 1
/
Section B
/
9
/
ii
/
b
/
Solution
Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge
/
2019
/
Paper 1
/
Section B
/
9
/
ii
/
c
/
Solution
Past exam of the physics of Nanoelectronic Systems course of the University of Cambridge
/
2013
/
Paper 1
/
2
/
Solution
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