MOS inversion threshold (${\psi }_s\simeq 2{\varphi }_F$)

For an ideal MOSFET with a nondegenerate p-type semiconductor of acceptor density $N_A$, define ${\varphi }_F=(k_{B}T/e)\ln (N_A/n_i)>0$, where $n_i$ is the intrinsic carrier concentration. A positive surface electric potential ${\psi }_s$ lowers the local conduction band and valence band by $e{\psi }_s$. The surface Electron density is $n_s=(n_i^2/N_A)\exp (e{\psi }_s/k_{B}T)$. Equality $n_s=N_A$ gives the conventional onset of strong inversion at ${\psi }_s=2{\varphi }_F$. The earlier crossover $n_s=p_s=n_i$ occurs at ${\psi }_s={\varphi }_F$. Neither condition requires the Fermi level to enter the conduction band.