Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge / 2018 / Paper 2 / Section B / 18

Across a radial section, the narrow-gap indium gallium nitride layer lies between wider-gap n-GaN and p-GaN. A suitable type-I band alignment has a downward conduction-band offset and upward valence-band offset in the indium gallium nitride, confining electrons and holes to the active layer. The original band sketch isolates those offsets; the complete junction also has doping-induced band bending.

At thermal equilibrium the Fermi level is common throughout. Forward bias separates the electron and hole quasi-Fermi levels, injects carriers from the n- and p-regions and permits electron-hole recombination in the thin active layer. A full radial line through the wire crosses two copies of the shell well; a core-to-exterior radial coordinate crosses one.

The 5 nm indium gallium nitride shell is the quantum well active region, not a metallic contact. Finite band offsets, confinement and polarization fields affect its transition energy; the bulk gap alone is insufficient.

A plausible role for the SiN mask is selective-area growth: restrict nucleation to exposed windows and suppress parasitic deposition between wires. Retained insulating material can also help prevent unwanted electrical paths during later processing. Which role dominates depends on the actual fabrication sequence. The cited source concerns core-shell single-wire LEDs and contact engineering, so a qualitative band sketch does not reproduce its complete device model.^[ref]

Two suitable epitaxial techniques are metalorganic vapour-phase epitaxy and molecular beam epitaxy.

MOVPE supplies metalorganic group-III precursors and a reactive nitrogen source in a flowing gas. Surface reactions, mass transport and selective nucleation control growth; it is well suited to conformal radial growth and relatively high throughput. molecular beam epitaxy supplies molecular/atomic beams in high vacuum, with beam fluxes and shutters controlling delivery. It offers precise flux switching and in-situ surface monitoring, but flux, geometry and nitrogen activation can limit growth rate and conformality. Neither method automatically gives identical growth on all wire crystal facets.

For an overall target near $40\mathrm{nm}\mathrm{mi}{\mathrm{n}}^{-1}=2.4\mu \mathrm{m}{\mathrm{h}}^{-1}$, MOVPE is a natural choice. This is a practical selection, not a theorem that molecular beam epitaxy cannot attain that rate.

Prepare the substrate/buffer and patterned SiN growth mask; grow donor-doped gallium nitride cores with controlled axial morphology; change conditions to favor radial deposition and incorporate indium for the thin indium gallium nitride active shell; then overgrow acceptor-doped p-GaN without degrading the active layer. Finally expose/contact the core and shell appropriately. Monitor facet-dependent thickness and indium content, and characterize the interfaces. If the active-layer normal rate itself were $40\mathrm{nm}\mathrm{mi}{\mathrm{n}}^{-1}$, 5 nm would take 7.5 s; the stated overall rate does not establish that the alloy shell actually grows at that same rate.

One possible cause is a different indium gallium nitride thickness or indium content that shifts this wire's emission away from 420 nm. The detected intensity at one wavelength then falls even if its integrated radiative efficiency is unchanged. Since $hc/(420\mathrm{nm})\simeq 2.95\mathrm{eV}$, composition, strain, confinement and internal fields can all move the transition relative to that detection energy.

A second physically different possibility is poor active-layer quality: roughness, composition segregation or strain relaxation can introduce defects and nonradiative recombination. Locally thinner or discontinuous shell regions may also permit carrier leakage.

Measure the full spectrum and integrated emission, rather than one spectral channel. Time-resolved luminescence, excitation-dependent measurements and local structural/compositional characterization can distinguish a spectral shift, changed carrier injection and an increased nonradiative rate. The single-wavelength observation alone does not uniquely identify lower internal quantum efficiency or one growth defect.