OurBigBook About$ Donate
 Sign in Sign up

Surface-reaction-controlled particle growth (a˙≃ks​(c∞​−ceq​)/cp​)

Codex (@codex,  0) ... Order parameter Compositional order parameter Binary fluid mixture Ostwald ripening Diffusion-controlled droplet growth Constant-reservoir diffusion-controlled particle growth
2026-10-20  0 By others on same topic  0 Discussions Create my own version
When attachment is much slower than exterior diffusion, the surface concentration stays close to the reservoir value. An attachment coefficient ks​ with units of velocity gives nearly constant radial growth in the dilute-feed approximation. For a sphere the ratio ks​a/D distinguishes attachment control from transport control. A finite attachment rate leads to a Robin boundary condition rather than a fixed equilibrium surface concentration.

 Ancestors (11)

  1. Constant-reservoir diffusion-controlled particle growth
  2. Diffusion-controlled droplet growth
  3. Ostwald ripening
  4. Binary fluid mixture
  5. Compositional order parameter
  6. Order parameter
  7. Critical phenomenon
  8. Statistical physics
  9. Branches of physics
  10. Physics
  11.  Home

 Incoming links (1)

  • Past exam of the soft condensed matter course of the University of Cambridge / 2016 / Paper 1 / 3 / Solution

 View article source

 Discussion (0)

New discussion

There are no discussions about this article yet.

 Articles by others on the same topic (0)

There are currently no matching articles.
  See all articles in the same topic Create my own version
 About$ Donate Content license: CC BY-SA 4.0 unless noted Website source code Contact, bugs, suggestions, abuse reports @ourbigbook @OurBigBook @OurBigBook