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Chemical vapor deposition (CVD) is a widely used thin-film deposition technique primarily employed in the fields of materials science, electronics, and nanotechnology. The process involves the chemical reaction of gaseous precursors to form a solid material that deposits on a substrate, resulting in a thin film or coating. **Key Features of CVD:** 1. **Process Steps**: - **Precursor Generation**: Gaseous precursors are introduced into a reaction chamber.