Measuring how specular reflection changes the polarization of an electromagnetic wave to infer optical properties.
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Ellipsometry is an optical technique used to measure the thickness and optical properties of thin films. It is based on the principle of polarized light and how its polarization state changes upon reflection from a sample surface. The technique is particularly sensitive to changes in film thickness, material composition, and refractive index, making it valuable in various fields, including materials science, semiconductor fabrication, and nanotechnology.