Diffraction contrast arises because elastic scattering transfers transmitted electron intensity between the direct beam and Bragg diffraction beams. A local change in crystal orientation, strain or thickness changes that transfer. An objective aperture selecting the direct beam makes strongly diffracting regions relatively dark in bright-field transmission electron microscopy; selecting a diffracted beam reverses the selection in dark-field transmission electron microscopy. This is a change in scattering conditions, not necessarily a change in chemical composition.
Three characteristic effects are bend contours, thickness fringes and dislocation contrast. Bend contours follow positions where a gently curved crystal meets a particular Bragg diffraction condition. Thickness fringes arise from thickness-dependent exchange of intensity between coupled transmitted and diffracted waves. A dislocation distorts nearby planes, changing their diffraction condition and producing localized contrast; changing the diffraction vector can suppress particular dislocations. Moiré fringes from overlapping lattices provide another acceptable example, but their coarse spacing is a beat spacing rather than an atomic spacing.
Use conventional bright-field transmission electron microscopy, with nearly parallel illumination, a suitably small objective aperture and low magnification covering the whole cross-section. More strongly scattering material sends more intensity outside the selected central beam and therefore looks darker. Tilt crystalline layers away from strong Bragg diffraction conditions to reduce diffraction contrast, and use a near-focus image so that electron phase contrast does not dominate.
The nominally uniform thickness helps separate composition from thickness variations, but does not make the contrast purely compositional: density, atomic number and multiple scattering still matter. Choose an accelerating voltage sufficient to transmit this thickness, commonly – for a robust inorganic film, subject to its damage limit. High-angle annular dark-field imaging in scanning transmission electron microscopy is a useful alternative for approximately monotonic mass-thickness contrast, but is a different acquisition mode and still requires thickness and detector-angle control.
Use a low-dose, dose-efficient acquisition rather than assuming that a lower accelerating voltage is always gentler. Focus and align on a sacrificial neighbouring region, blank the beam between exposures, illuminate only when recording and use an efficient detector. A broad, low-current-density transmission electron microscopy exposure can avoid a high instantaneous local dose; scanning can also work if probe current, dwell time and repeated visits are controlled.
Radiolysis starts with inelastic scattering and ionization. For an appropriate thin specimen, increasing the electron energy can reduce the inelastic interaction probability and energy deposition per incident electron, so a relatively high voltage can help. However, increasing voltage can also activate knock-on displacement. The optimum therefore depends on the material and the amount of useful information obtained per damaging event; alone does not determine it. Cooling may reduce diffusion-driven chemical changes but does not eliminate primary ionization. An experimental study of nonbiological layered polymer films explicitly found that the voltage choice must balance damage with image signal.[ref]
Use high-resolution transmission electron microscopy with a coherent, well-aligned beam and an objective aperture admitting the direct beam and the spatial frequencies required at the interface. Orient a crystalline region near a suitable zone axis so that useful lattice fringes are excited; minimize drift, vibration and astigmatism. Choose defocus and aberration correction to transfer the target frequencies, rather than treating the image as a direct map of atoms at arbitrary defocus.
An aberration-corrected scanning transmission electron microscopy probe with high-angle annular dark-field imaging can instead resolve an interface with more directly interpretable atomic-number contrast. A nominal thickness may be too great for clean atomic-resolution interpretation: thin the interface further if necessary, finish focused ion beam milling at lower ion energy to reduce damaged surface layers, and check for curtaining and implantation. The best mode depends on crystallinity and damage sensitivity; an amorphous interface calls for resolving its boundary and composition rather than inventing lattice fringes.

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