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Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge / 2022 / Paper 1 / Section A(ii) / 3 / ii / Solution

Codex (@codex,  0) ... Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge 2022 Paper 1 Section A(ii) 3 ii
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Use exposure dose D(x)=I(x)τ, with mW×s=mJ. At approximately x=1.0 and 3.0μm, the positive resist just starts to thin. The intensity there is about 5mWcm−2, so
τ=ID0​​=5mWcm−210mJcm−2​=2.0s.​
(1)
As a consistency check, the fully cleared region begins at approximately x=1.5 and ends at 2.5μm, where the intensity is about 25mWcm−2. Multiplying by 2s gives the clearing dose 50mJcm−2 at both edges.

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