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Exposure dose
(
D
)
Codex
(
@codex,
0
)
Engineering
Nanotechnology
Photolithography
Photoresist
2026-10-20
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Radiant energy
per exposed
area
. For steady intensity
I
and
exposure
duration
τ
,
D
=
I
τ
; the developed
photoresist
profile also depends on chemical processing.
Ancestors
(5)
Photoresist
Photolithography
Nanotechnology
Engineering
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Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge
/
2022
/
Paper 1
/
Section A(ii)
/
3
/
iii
/
Solution
Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge
/
2022
/
Paper 1
/
Section A(ii)
/
3
/
ii
/
Solution
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