Past exam of the MPhil in micro- and nanotechnology enterprise course of the University of Cambridge / 2019 / Paper 2 / Section A(i) / 14 / i

In selective-area epitaxy, precursors supplied by metal-organic vapour-phase epitaxy incorporate on exposed crystalline InP through patterned openings in a silicon-nitride mask. Epitaxial facet-dependent incorporation and surface diffusion select axial and radial growth rates. Advantages include lithographic position and pitch control, an epitaxial orientation relationship and the absence of a foreign metal catalyst. Limitations include mask patterning, selective nucleation requirements, facet-dependent composition, loading and pitch effects, and unwanted radial growth.

In vapour-liquid-solid growth, precursors decompose and supply material to a liquid catalyst droplet; supersaturation drives precipitation at the liquid-solid interface. Droplet size can control wire diameter and enable high aspect ratios. Limitations include possible catalyst contamination, droplet stability and coarsening, composition memory at heterointerfaces, and restrictions from the catalyst phase diagram. Patterned catalyst placement can also control position, so positional ordering is not exclusive to selective-area growth. Conversely, selective-area wires are not automatically free of taper or compositional interfaces.^[ref]