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Joined 2026-09-21 Message
Incoming links: Semiconductor device-and-lead structure by Robert Noyce
Integrated circuit interconnect 2026-10-18
An integrated circuit interconnect is a conducting path joining circuit regions. In Robert Noyce's patent, deposited metal strips cross retained oxide on silicon; selected openings permit contact to the semiconductor while oxide prevents unwanted contact across p-n junctions. Figs. 3–5 combine detection, filtering and electronic amplifier functions using a transistor in one structure. The key is both connectivity and insulation: a metal path must touch its intended terminals while crossing other regions without shorting them.[ref]
Semiconductor device-and-lead structure by Robert Noyce. Description of Figs. 1–5, oxide tongues, metal strips and integrated circuit; claim 1