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Dopant atoms and carrier type. Substitutional semiconductor doping places a small fraction of foreign atoms on host lattice sites. In a tetrahedrally bonded group-IV semiconductor, a group-V substitution such as phosphorus in silicon has an extra valence Electron. A shallow donor level just below the conduction edge can release that Electron, leaving a positively charged donor. In an n-type semiconductor, mobile Electrons are the majority carriers and the chemical potential shifts toward the conduction band.

A group-III substitution such as boron in silicon has one fewer valence Electron. An acceptor level just above the valence edge captures an Electron from the valence states, leaving a mobile electron hole and a negatively charged acceptor. In a p-type semiconductor, electron holes are the majority carriers and the chemical potential shifts toward the valence band. The material can remain electrically neutral in both cases: mobile carrier electric charge is compensated by fixed ionized impurity electric charge. Dopant freeze-out, compensation and degeneracy qualify the simplest one-carrier-per-dopant picture.

Making the junction. Choose p material at $x<0$ and n material at $x>0$. Electrons initially diffuse from n to p, and electron holes from p to n, recombining near the interface. Negative ionized acceptors are exposed on the p side and positive ionized donors on the n side. They produce an electric field directed from n to p. The field opposes further majority-carrier diffusion until drift and diffusion balance and the equilibrium electrochemical potential is uniform.

The depletion regions are depleted of mobile majority carriers, not of the fixed dopant charges that create the space charge. At equilibrium the conduction and valence edges bend together, while the chemical potential is flat. The specified $\Delta {\varphi }_0$ is a electric potential difference: the corresponding initial chemical-potential energy separation is $e\Delta {\varphi }_0$. This convention is required by the quoted units and width formulas. Write ${\epsilon }_s=ϵ{ϵ}_0$ for the absolute permittivity; the paper's $ϵ$ is relative permittivity.

Poisson equation and widths. Let the depleted intervals be $-w_p<x<0$ and $0<x<w_n$. Fully ionized number densities $N_A,N_D$ correspond to electric charge densities $-e{N}_A,+e{N}_D$, respectively. ThusThe factor $e$ converts a dopant concentration to a space-charge density. Requiring zero field in both neutral regions gives charge neutrality,With $\mathcal{E}=-{\varphi }^{\prime }$, direct integration gives the triangular fieldContinuity at the interface is the same neutrality condition. The field is negative throughout the depleted interval. Set $\varphi (-w_p)=0$. Its integral givesPotential continuity therefore requiresCombining it with neutrality yields the abrupt-junction depletion width and capacitance resultsThe more lightly doped side depletes farther, because equal and opposite space charges must be exposed.

Applied bias. Define positive $V$ as forward bias, raising the p-side terminal potential relative to the n-side terminal. It lowers the remaining barrier from $\Delta {\varphi }_0$ to $\Delta {\varphi }_0-V$. Reverse bias has $V<0$ and raises that barrier. The same Poisson integration applies, with this replacement:Forward bias narrows the depleted region; reverse bias widens it. Under bias there need not be one equilibrium chemical potential across the device, so the equilibrium flat-level argument must not be reapplied unchanged. The barrier/width change is illustrated in the next figure.

Differential capacitance and electric charge sign. Put $B=\Delta {\varphi }_0-V>0$ and $N_{\mathrm{eff}}=N_A{N}_D/(N_A+N_D)$. The signed p-side fixed electric charge per unit area isDifferentiating with respect to forward electric potential difference gives the positive capacitance per unit areaThe n-side electric charge is $Q_n=-Q_p$, so $d{Q}_n/dV=-C_A$ instead. If $Q$ denotes a positive space-charge magnitude, the positive capacitance is $-dQ/dV$ for this forward-voltage convention. This resolves the sign implicit in the paper's positive $dQ/dV$. The total device capacitance is $C=\mathcal{A}{C}_A$, where $\mathcal{A}$ is its cross-sectional area.

Finite device and numerical sketch. For the symmetric device, $N_A=N_D=N$ and each side has thickness $d$. Before full depletion,Using ${\epsilon }_s=12{ϵ}_0=1.0625\times 10^{-10}\mathrm{F}{\mathrm{m}}^{-1}$, the zero-bias width on each side is $4.07\mu \mathrm{m}$, less than $d=10\mu \mathrm{m}$. The total zero-bias capacitance is $\boxed{C(0)\simeq 1.30\mathrm{pF}}$.

Full depletion occurs when $w=d$, soAt larger reverse bias the depleted thickness cannot exceed $2d$. In the ideal fully depleted slab, incremental terminal electric charge changes the field uniformly through that fixed thickness, giving the full-depletion capacitance of a symmetric junction slabThus the idealized piecewise sketch over the specified range isIt is continuous at full depletion, rises through $1.30\mathrm{pF}$ at zero bias, and has a formal inverse-square-root divergence as $V\to 0.5\mathrm{V}$ from below.

There are two physical limits to this extension. Once all dopants are exposed, their fixed space charge no longer increases, but the terminal electrodes can still acquire incremental electric charge; differentiating only the fixed ionized electric charge would incorrectly predict zero capacitance. Near $V=\Delta {\varphi }_0$, the depletion approximation itself fails as mobile carriers and forward injection become important, so the formal infinite endpoint is not a prediction of an actual infinite measured capacitance. The fully depleted plateau assumes ideal contacts and no breakdown, injection storage or extra series capacitance.

Substitutional semiconductor doping replaces selected host atoms with impurity atoms on ordinary lattice sites. A shallow donor impurity can supply a mobile conduction electron and remain positively charged; a shallow acceptor impurity can capture an electron and leave a mobile valence hole, remaining negatively charged. In nondegenerate, substantially ionized material, donor-dominated doping raises the chemical potential toward the conduction edge and acceptor-dominated doping lowers it toward the valence edge. Dopants do not create net bulk charge in a neutral sample: fixed impurity charge compensates the mobile carrier charge. Freeze-out, compensation and degeneracy qualify the simplest relation between dopant and carrier densities.