B. O. Dabbousi Created 2026-10-20 Updated 2026-11-05
A researcher who coauthored the synthesis and characterization of light-emitting core-shell quantum dots. A zinc sulfide shell surrounded a cadmium-selenide core, improving emission while the core size tuned its color. Optical measurements and structural probes were combined to connect the shell's growth with photoluminescence, making surface treatment part of the design of a nanoscale light source.[ref]
(CdSe)ZnS Core-Shell Quantum Dots: Synthesis and Characterization of a Size Series of Highly Luminescent Nanocrystallites by B. O. Dabbousi and others. Abstract: size series, ZnS passivation, emission and structural characterization
GaN blue LED development Created 2026-10-18 Updated 2026-10-31
Isamu Akasaki chose metalorganic vapour-phase epitaxy and sapphire, which tolerated hot Ammonia. Large lattice mismatch hindered film growth. In 1985, Hiroshi Amano and Isamu Akasaki's group developed an aluminium nitride epitaxial buffer layer deposited before hotter gallium nitride growth. The buffer supplies initial growth sites; growing islands join into a continuous film. It improves growth without making the lattices identical. Isamu Akasaki separately credits Shuji Nakamura's 1991 gallium nitride buffer.[ref]
https://www.kapitza.ras.ru/~glazkov/students/Nobel-akasaki-lecture.pdf. §§3.2–4.2, pp. 13–20, Figs. 7–11: growth sequence and microscopy
The 1986 growth paper reports a vertical metalorganic vapour-phase epitaxy reactor, source gases mixed just before delivery to slanted sapphire, and subsequent gallium nitride growth over aluminium nitride. Surface microscopy, X-ray diffraction and photoluminescence tested different aspects of the result. Buffered and unbuffered growth supplied the comparison. Its reported preparation conditions should not be replaced by one universal buffer temperature: the later lecture's account of the first low-temperature trial and the paper's parameter study describe different stages of development.[ref]
Metalorganic vapor phase epitaxial growth of a high quality GaN film using an AlN buffer layer by Hiroshi Amano and others. p. 353, Fig. 1 and Table I; p. 354, surface and diffraction comparisons
A magnesium acceptor impurity in gallium nitride accepts a valence band electron, leaving a mobile electron hole. Hydrogen passivation of magnesium acceptors in gallium nitride suppresses this activity. Post-growth activation restores existing impurities' electrical activity; ionization of active acceptor impurities supplies mobile electron holes. Adding magnesium alone is insufficient.[ref]
In 1989, Hiroshi Amano, Masahiro Kito, Kazumasa Hiramatsu and Isamu Akasaki obtained p-type semiconductor conduction in magnesium-doped gallium nitride using low-energy electron beam irradiation. Hiroshi Amano recalls initially resistive samples, an unreliable hot-probe test, then Masahiro Kito's Hall effect confirmation. A junction irradiated in an M-shaped region emitted in that pattern. Treatment, carrier-sign measurement and spatial emission supplied different evidence. Earlier zinc-doped samples brightened under irradiation without becoming p-type semiconductors: brightness alone did not prove the carrier sign.[ref]
https://journals.aps.org/rmp/pdf/10.1103/RevModPhys.87.1133. §V, pp. 1135–1136, Figs. 3–4; authors of 1989 paper in references, p. 1137
Shuji Nakamura, Takashi Mukai, Masayuki Senoh and Naruhito Iwasa's 1992 thermal-activation paper established another route using annealing in nitrogen. Their companion study compared already conducting films heated in nitrogen with films heated in Ammonia: the latter became highly resistive again. Its hydrogen-complex explanation connected this atmosphere dependence to acceptor impurity passivation. These are thermal treatment and atmosphere comparisons, distinct from the earlier electron beam intervention; neither observation alone images an individual hydrogen complex.[ref]
Thermal Annealing Effects on P-Type Mg-Doped GaN Films by Shuji Nakamura and others. abstract: nitrogen annealing above 700 degrees Celsius and electrical changes
[ref]Hole Compensation Mechanism of P-Type GaN Films by Shuji Nakamura and others. p. 1258, abstract and §§1–2: activation history, nitrogen/ammonia comparison and hydrogenation hypothesis
Shuji Nakamura's two-flow metalorganic chemical vapor deposition reactor, gallium nitride buffer, thermal activation and improved indium gallium nitride growth enabled bright double heterostructure devices, followed by thinner quantum well devices.[ref]
The original 1994 paper by Shuji Nakamura, Takashi Mukai and Masayuki Senoh describes a sapphire/gallium nitride-buffer device with zinc-doped indium gallium nitride emission and aluminium gallium nitride confinement. After nitrogen annealing, etching exposed the n-side for a separate contact. At room temperature, varied forward electric currents gave emission spectra and optical-output curves alongside a current-voltage characteristic. At : output, peak wavelength, terminal electric potential difference. The peak stayed nearly fixed across the current series. The paper omits a complete calibrated collection apparatus; comparisons with earlier devices change several preparation details.[ref]
Candela-class high-brightness InGaN⁄AlGaN double-heterostructure blue-light-emitting diodes by Shuji Nakamura and others. pp. 1687–1688, fabrication and Figs. 1–4
Nobuhiko Sawaki Created 2026-10-18 Updated 2026-11-05
Nobuhiko Sawaki coauthored a method for growing gallium nitride on sapphire by metalorganic vapour-phase epitaxy, introducing an aluminium nitride layer before the main film. The films had flat, crack-free surfaces, with X-ray diffraction and photoluminescence used to assess their quality.[ref]
Metalorganic vapor phase epitaxial growth of a high quality GaN film using an AlN buffer layer by Hiroshi Amano and others. Applied Physics Letters 48 (1986), pp. 353–355: author list and abstract, atmospheric-pressure growth with AlN layers and optical/diffraction characterization; primary article copy.
An exciton is a correlated electron–hole pair with a full wavefunction . In strong confinement, a useful leading approximation is a product of lowest electron and hole envelope functions, followed by a Coulomb correction. A spherical hard-wall ground envelope is nodeless, proportional to , and finite at the origin. Finite barriers produce exterior tails.
For a core-shell semiconductor nanocrystal with type-I band alignment, both conduction- and valence-band offsets confine the carriers mainly to the core. Their envelopes penetrate the shell but overlap less with external traps. Chemical surface passivation and spatial separation from defects can suppress nonradiative losses and increase photoluminescence quantum yield. Shell thickness, interfacial quality and strain must be controlled; a defective shell can introduce losses.
A larger shell band gap alone does not guarantee type-I alignment. A staggered type-II band alignment can move one carrier toward the shell, reduce electron–hole overlap and alter lifetime and emission energy. The sketch illustrates the conditional type-I case. In CdSe/ZnS experiments, optical spectra were combined with structural and compositional measurements to test shell-growth interpretations.[ref]
(CdSe)ZnS Core-Shell Quantum Dots: Synthesis and Characterization of a Size Series of Highly Luminescent Nanocrystallites by B. O. Dabbousi and others. 1997, abstract: spectroscopy, structural/compositional characterization and locally epitaxial shell growth
Photoluminescence Created 2026-10-18 Updated 2026-11-05
Photoluminescence is light emission following absorption of incident photons. The excitation first puts matter into excited states; subsequent relaxation can emit at a different wavelength. Fluorescence and phosphorescence are distinct forms whose timing and transition mechanisms differ.
An excitation source, sample, rejection filter and spectrometer form a simple experiment. Place collection optics away from the directly transmitted beam and suppress excitation light before measuring the emission optical spectrum. Recording an empty holder or solvent blank helps identify background. Emission intensity alone does not determine absorption or quantum yield, because collection geometry and nonradiative relaxation also affect the signal.
Y. Toyoda Created 2026-10-18 Updated 2026-11-05
Y. Toyoda coauthored a method for growing gallium nitride on sapphire by metalorganic vapour-phase epitaxy, introducing an aluminium nitride layer before the main film. The films had flat, crack-free surfaces, with X-ray diffraction and photoluminescence used to assess their quality.[ref]
Metalorganic vapor phase epitaxial growth of a high quality GaN film using an AlN buffer layer by Hiroshi Amano and others. Applied Physics Letters 48 (1986), pp. 353–355: author list and abstract, atmospheric-pressure growth with AlN layers and optical/diffraction characterization; primary article copy.