LiftMode is a two-pass measurement separating a measured topographic path from a longer-range interaction measurement. The first pass records height with ordinary topographic feedback. On the second pass the tip retraces that line at a chosen vertical offset above it, reducing contact and short-range contributions while detecting electrostatic or magnetic interactions.
The lift height is relative to the recorded path, not a single constant laboratory height over a corrugated sample. Its usefulness depends on first-pass accuracy and whether the relevant long-range signal remains detectable at that separation.[ref]
Scanning Probe Microscopy Modes by Bruker. LiftMode two-pass description and retracing the stored topography with a height offset
Use Kelvin probe force microscopy to quantify a local contact-potential difference. A conducting tip and sample form a position-dependent capacitor. Apply a voltage with adjustable direct and small alternating components,The electrostatic force is proportional to , so its component at is proportional toup to the chosen force-direction convention. A lock-in amplifier detects this component and a second controller adjusts to null it. At the null, . The compensation voltage becomes the potential image.[ref]
Scanning Probe Microscopy Modes by Bruker. Surface Potential Imaging: conducting probe and electrostatic null measurement
A lift pass can reduce direct topographic interactions. Calibration on a reference with a known work function is required for an absolute work-function interpretation, and the sign convention must state which electrode is biased. On a semiconductor the result can include surface band bending, trapped charge and surface chemistry, so it need not equal a simple map of bulk electrochemical potential.
The measured potential is a spatially weighted electrostatic signal, not an infinitesimal-point voltage. The apex, cone and cantilever all contribute capacitance; increasing lift height weakens the signal and broadens its lateral averaging. Small pits can consequently show reduced or distorted contrast.
Imperfect topographic tracking changes the true separation on the lift pass, producing crosstalk correlated with pit geometry. Tip contamination or work-function drift changes the reference. Adsorbed water, mobile charges, illumination, atmosphere and surface states can change the specimen during measurement; semiconductor band bending can also depend on the applied electrical excitation.
There is a tradeoff between small lift height and suppressing short-range/topographic interference. Repeat at several heights, check trace/retrace and an electrical reference, and compare with independently measured electrical response. A stable potential contrast is evidence of a local electrostatic difference, not by itself proof of a particular dislocation's conductivity.
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