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A bipolar junction transistor has two p-n junctions sharing a thin base region, arranged n-p-n or p-n-p. In its forward amplification regime, the emitter junction injects minority carriers; many cross the base before electron-hole recombination and reach the reverse-biased collector junction.^[ref]

For a long, nondegenerate, ideal p-n junction under low injection, the diode saturation current is set by minority carriers supplied from the neutral regions. Their equilibrium densities are $n_{p0}=n_i^2/N_A$ and $p_{n0}=n_i^2/N_D$. Solving the steady diffusion and recombination equations gives $I_S=e\mathcal{A}(D_n{n}_{p0}/L_n+D_p{p}_{n0}/L_p)$, where $\mathcal{A}$ is junction area, $D_n,D_p$ are diffusion coefficients, and $L_n,L_p$ are diffusion lengths. Reverse bias suppresses opposite majority-carrier injection exponentially while collecting this minority supply. Thus $I_S$ is approximately bias independent before breakdown, but depends strongly on temperature through $n_i^2$ and on transport, doping, and geometry.

The incremental capacitance associated with changes of electric charge around a p-n junction. Its depletion contribution is often estimated by $C_j\simeq {\epsilon }_{s}A/W$, so an independent junction capacitance measurement can constrain the width $W$ of the depletion region under the model assumptions. Other stored electric charge, including injected minority carriers, can also contribute to a measured terminal capacitance.

Semiconductor doping introduces impurities with levels close to the band edges. A donor impurity can release an Electron to the conduction band, leaving a fixed positive ion; an n-type semiconductor has Electrons as majority carriers. An acceptor impurity can take an Electron from the valence band, leaving a mobile hole and fixed negative ion; a p-type semiconductor has holes as majority carriers. The opposite species remains as a minority carrier population, and a neutral bulk sample balances the ionised dopants with mobile carriers.

At a p-n junction, concentration gradients initially drive Electrons and holes across the join. Their removal near the join exposes negative acceptor ions on the p side and positive donor ions on the n side, forming a depletion region. Its electric field opposes further majority-carrier diffusion. Equilibrium has a flat Fermi level, no net current and spatially bent band edges. With p on the left and n on the right, the Electron band edges fall towards the n side; the difference is the equilibrium barrier in Electron energy. A flat Fermi level does not mean flat conduction and valence edges.

Doping changes the mobile carrier population by introducing controlled impurity levels. In an intrinsic semiconductor, the filled valence band is separated from the nearly empty conduction band by a band gap $E_g$. Thermal excitation produces an electron-hole pair, so the Electron and hole number densities obey $n=p=n_i$. A electron hole represents a missing valence-band Electron and behaves as a mobile positive charge carrier. For nondegenerate bands in thermal equilibrium,Here $N_C,N_V$ are the effective density of states, $E_C,E_V$ the band edges, and $E_F$ denotes the chemical potential, conventionally called the Fermi level. The semiconductor mass-action law holds in this nondegenerate equilibrium regime.

In a tetrahedrally bonded elemental semiconductor such as silicon, a substitutional group-V atom has an extra outer Electron relative to the host. It is a donor impurity: a shallow level just below $E_C$ can ionise, releasing an Electron to the conduction band and leaving a fixed positively charged donor. The resulting n-type semiconductor has Electrons as majority carriers and holes as minority carriers. Conversely a group-III substitution supplies one fewer bonding Electron. An acceptor impurity can take an Electron from the valence band, leaving a mobile electron hole and a fixed negative acceptor; the resulting p-type semiconductor has holes as majority carriers.

The impurity state is shallow because the Electron or hole responds to a screened Coulomb potential and an effective mass, rather than the bare atomic potential. A simple hydrogenic donor estimate iswhere ${ϵ}_r$ is the relative permittivity. This is a useful scaling model, with real band anisotropy and central-cell effects omitted. Dopants are fixed in the lattice; their ionisation changes mobile carrier numbers without making a uniformly doped bulk sample carry a large net electric charge.

The charge neutrality condition isWhen shallow dopants are almost fully ionised and $N_D-N_A\gg n_i$, an n-type region has $n\simeq N_D-N_A$ and $p\simeq n_i^2/n$. A p-type region similarly has $p\simeq N_A-N_D$ and $n\simeq n_i^2/p$. Thus compensation by the opposite impurity type reduces the majority-carrier density; the total dopant concentration is not generally the mobile carrier density. At sufficiently high impurity density the degenerate semiconductor regime requires the full Fermi-Dirac distribution and these exponential approximations fail.

There are three useful temperature regimes. At low temperature, dopant freeze-out leaves many shallow levels un-ionised. In the extrinsic regime, the dopants are largely ionised and set the majority-carrier density. At high enough temperature, intrinsic pair creation dominates and $n,p$ approach $n_i$. The Fermi level moves towards the conduction band with donor doping and towards the valence band with acceptor doping. The electrical conductivity isDoping therefore controls conductivity and its carrier type, but ionised impurities also scatter carriers and can reduce charge carrier mobility. Carrier density and mobility must both be considered.

A p-n junction forms when p-type and n-type regions are joined within a semiconductor. Initially the concentration gradients drive diffusion current: Electrons diffuse from the n region to the p region and holes in the opposite direction. Recombination removes mobile majority carriers near the join, exposing fixed positive donors on the n side and fixed negative acceptors on the p side. This forms a depletion region and an electric field directed from n to p. Its drift current opposes diffusion. At equilibrium the net current vanishes and the Fermi level is uniform, although the band edges vary spatially through band bending.

For an abrupt nondegenerate junction with fully ionised dopants, its built-in potential isUnder the depletion approximation, the space-charge densities are $-e{N}_A$ on a p-side width $w_p$ and $+e{N}_D$ on an n-side width $w_n$. Integrating Poisson equation and imposing zero field outside gives $N_A{w}_p=N_D{w}_n$ andMost of the depletion width therefore extends into the more lightly doped side. The schematic shows the impurity levels before contact and the resulting space charge and potential after contact; there is no externally extractable equilibrium battery voltage from the built-in field alone.

A forward bias, with p positive relative to n, reduces the barrier from $V_{\mathrm{bi}}$ towards $V_{\mathrm{bi}}-V$ and injects minority carriers across the junction. In the ideal low-injection, diffusion-controlled regime this produces the Shockley diode equation, $I=I_s[e^{eV/(k_{B}T)}-1]$. Reverse bias increases the barrier and the depletion region; only a small thermally generated minority-carrier current flows before breakdown. Reverse-biased depletion regions also give a voltage-dependent junction capacitance. Real devices have recombination, leakage, series resistance and breakdown mechanisms beyond the ideal law. Controlled doping creates majority and minority carriers, and their junction produces a depletion barrier that makes rectification possible.

Equilibrium junction. Put the p-type side on the left and n-type side on the right. When they are joined, Electrons diffuse from n to p and electron holes diffuse from p to n. This leaves negative ionized acceptors on the p-side and positive ionized donors on the n-side of the depletion region. The resulting built-in electric field points from n to p, opposing further diffusion. At equilibrium there is one constant Fermi level, and drift and diffusion currents cancel for each carrier species.

In the nondegenerate, fully ionized limit, the neutral-region carrier densities areThe conduction band and valence band lie higher on the p-side and bend down towards the n-side. The gap between them stays fixed for a homojunction. If $\psi$ increases towards the n-side, both edges shift by $-e\psi$, whileThus $n$ rises and $p$ falls continuously across the junction; neither mobile population is an exact step function. Their depletion exposes fixed dopant charge density, rather than an absence of every kind of charge. The built-in voltage is

Light emission. Forward bias lowers the barrier and injects minority carriers across the p-n junction. In a light-emitting diode, electron-hole recombination converts some of their energy into photons. A direct band gap permits efficient radiative transitions with nearly conserved crystal momentum; nonradiative channels compete. Near-edge emission has $\hslash \omega \simeq E_g$ and $\lambda \simeq hc/E_g$. Material composition and confinement select the emission colour. Reverse-bias saturation is not the ordinary LED operating mode.

Reverse current. Take $V=V_R>0$ and $I_R>0$ to mean reverse voltage and reverse current magnitudes. The Shockley diode equation in this convention isThe bias-independent $I_S$ term is the supply of thermally excited minority carriers from the neutral regions, swept across the junction by its electric field. The opposing injection current is reduced by the extra barrier energy $e{V}_R$ and is $I_S{e}^{-e{V}_R/(k_{B}T)}$. Their equality gives zero net current at zero bias; for $e{V}_R\gg k_{B}T$, the reverse current approaches $I_S$ until leakage or breakdown invalidates this ideal law. The collecting field need not create the minority carriers; their thermal supply limits the diffusion-dominated current.

For an ideal long junction of area $\mathcal{A}$, steady diffusion with recombination gives the diode minority-carrier diffusion currentIt depends on doping, geometry, carrier diffusion coefficients and lifetimes, and especially the intrinsic carrier concentration. Depletion-region generation current and surface leakage can add nonideal contributions to the measured reverse current.

Band-gap estimate from the data. Read a nearly flat region well above the small-bias knee and below the high-bias upturn, rather than estimating $I_S$ in the breakdown region. For a diffusion-dominated junction with nearly temperature-independent gap and effective masses,so $I_S=C(T)T^3{e}^{-E_g/(k_{B}T)}$, where $C(T)$ includes transport and doping factors. Extracting a semiconductor band gap from diode saturation current amounts to measuring the slope of $\ln [I_S/(C(T)T^3)]$ against $1/T$: it is $-E_g/k_B$. If the prefactor is taken approximately constant over a short interval,Approximate readings from the original PDF plateaus areUsing the two warmer curves and $k_B=8.6173\times 10^{-5}eV/K$ givesKeeping the $T^3$ factor but taking the residual transport factor constant changes this estimate to approximately $0.57\mathrm{eV}$. The justified graphical estimate is thereforeThe colder curve is a genuine limitation of the supplied data: the $0$ to $-45{}^{\circ }\mathrm{C}$ pair gives only about $0.32\mathrm{eV}$ with a constant prefactor, and the endpoint pair gives about $0.42\mathrm{eV}$. Thus all three cannot support one precise diffusion-only activation slope. A depletion-region generation current, approximately proportional to $n_i$ rather than $n_i^2$, can have a roughly half-gap activation energy; other leakage and temperature-dependent transport can also alter the slope. The PDF alone does not identify their relative contributions. A reliable precision gap measurement would use more temperatures and verify the transport regime instead of forcing one fit through these three readings.

At equilibrium the diffusion currents and drift currents cancel separately for each carrier species. Electron diffusion is from n to p, while the electric field drives electrons from p to n; hole diffusion is from p to n, while hole drift is from n to p. The net current is zero, although these opposing microscopic fluxes are present. In conventional-current signs, both majority diffusion contributions point p to n and the balancing drift contributions point n to p.

Forward bias, $V_{\mathrm{ext}}>0$, reduces the barrier and enhances majority-carrier diffusion and minority carrier injection. The ideal low-injection Shockley diode equation giveswhere positive current is p to n. For reverse bias, majority diffusion is suppressed and the field sweeps thermally supplied minority carriers across the junction, giving approximately $J=-J_s$. This saturation is limited by carrier supply rather than a current proportional to the field. Depletion-layer generation, recombination and eventual diode reverse breakdown modify the ideal result.

The positive charge per unit interface area on the n side and negative charge on the p side areUse the signed p-side charge $Q=Q_p$ because $V_{\mathrm{ext}}$ is the p-side voltage relative to n. Differentiating the width relation givesUsing part (e), the positive junction capacitance per unit area isIt decreases with increasing reverse-bias magnitude as $(V_b+|V_{\mathrm{ext}}|{)}^{-1/3}$. Equivalently,so a linear $C^{-3}$ versus voltage plot diagnoses this ideal linear grading and can determine $\alpha$.

For this linearly graded junction capacitance, the charge convention matters: if “stored charge” means the positive magnitude $Q_n$, then $d{Q}_n/d{V}_{\mathrm{ext}}=-{\epsilon }_s/w$; the positive measured capacitance is $-d{Q}_n/d{V}_{\mathrm{ext}}=d{Q}_n/d{V}_R$ for $V_R=-V_{\mathrm{ext}}$. The total net depletion charge is zero and is not the stored terminal charge. At substantial forward bias, minority carrier storage and the failure of the sharp depletion approximation prevent extrapolation of the apparent divergence at $V_{\mathrm{ext}}=V_b$.

A semiconductor has an electronic band gap and a conductivity strongly affected by temperature, impurities and carrier injection. Optical absorption can create mobile electrons and holes, enabling a photodiode.

The useful feature of a semiconductor is that its charge carrier population can be controlled. Semiconductor doping changes the supply of mobile Electrons or electron holes; carrier injection changes their population away from thermal equilibrium. A transistor turns that control into an electronic amplifier: a small input signal controls a larger flow of supplied energy.

For a uniform semiconductor in a weak electric field, a simple drift model writes its electrical conductivity asHere $q>0$ is the elementary charge, $n,p$ are the number densities of mobile Electrons and electron holes, and ${\mu }_n,{\mu }_p$ their positive charge carrier mobilities. The two contributions add because opposite electric charges drift in opposite directions and therefore carry electric current in the same direction. This model assumes fixed temperature and mobilities and omits diffusion from density gradients.

An original dimensionless example isolates the effect of carrier injection. Suppose initially $p\ll n=n_0$ and ${\mu }_n=2{\mu }_p$. Adding equal excess populations $\Delta n=\Delta p=0.1n_0$ gives $\Delta \sigma /{\sigma }_0=0.15$, even though the added electron holes remain a minority carrier population. A semiconductor can respond strongly to a small injected population without changing its underlying band gap.

William Shockley's proposal used transport through the bulk of a semiconductor, rather than coupling between two surface points. The base must be thin enough for injected minority carriers to reach the collector. Two separately wired diodes do not supply that shared transport region. The proposal was a design principle; producing a working device required further control of material properties.^[ref]