For a nondegenerate semiconductor with donor density , no acceptors, and donor energy , an occupied donor has two electron spin states while an empty donor has one. Its ionized fraction is therefore . The conduction-band relation gives . Combining charge neutrality, , with the semiconductor mass-action law, , proves the displayed equation.
Its left side increases strictly for and its right side decreases, so there is one physical solution, with . In the freeze-out regime, holes are negligible and solving the quadratic gives . Strong dopant freeze-out reduces this to . An extrinsic plateau requires and , not simply .
Compensated semiconductor 2026-10-20
A compensated semiconductor contains both donor impurities and acceptor impurities. In a nondegenerate equilibrium model with both species fully ionized, charge neutrality gives , while the semiconductor semiconductor mass-action law gives . Solving yields
For and , and . Numerically the minority concentration is better obtained as than by subtracting nearly equal numbers. If dopants are only partly ionized, replace in charge neutrality by their ionized concentrations and determine the chemical potential self-consistently.
Assume dilute nondegenerate electrons and electron holes, parabolic three-dimensional band edges with the stated scalar band effective masses, spin multiplicity two, one effective valley for each edge, and thermal equilibrium. Take the unchanged host ground state to have unit activity and neglect bound excitons. The effective density of states values are
For a Fermi level between the band edges,
The factors of cancel on multiplication. With , the semiconductor mass-action law is
This density-form equilibrium constant has units . A dimensionless thermodynamic constant uses a specified reference number density , giving . The dot representing the host ground state is not a freely translating gas species requiring a further gas partition function. For an intrinsic semiconductor, charge neutrality gives .
Retain the inferred mobilities and assume one ionized donor per added arsenic atom, negligible compensation, the same band gap, and the nondegenerate semiconductor mass-action law. Relative to the intrinsic sample, a conductivity factor requires
For complete donor ionization, charge neutrality gives , so
The host atom density, using , is
Thus the required atomic fraction is
approximately one donor per host atoms. The electron density must rise to about , not , because the original intrinsic sample conducted through both electrons and holes. This is an estimate under unchanged mobility: impurity scattering, incomplete ionization, compensation and band-edge changes can alter it. Here , so the nondegenerate treatment is an approximation rather than an arbitrarily dilute limit.
Assume thermal equilibrium, nondegenerate carriers, and isotropic parabolic band dispersions, with the supplied effective masses interpreted as density-of-states masses. Take one effective valley with two electron spin states for each band; any additional valley multiplicity must instead be absorbed into the masses or explicit degeneracy factors.
Let the conduction band edge be , the valence band edge , and . The spin-summed conduction density of states per volume is
Using the nondegenerate limit of the Fermi-Dirac distribution and the substitution gives
The factor in the supplied integral produces the normalization. Counting missing valence band electrons similarly gives
Multiplication cancels the chemical potential, establishing the semiconductor mass-action law:
The result does not require an intrinsic semiconductor: semiconductor doping changes and separately while preserving this product under the stated equilibrium and nondegeneracy assumptions.
With the supplied fixed band gap and effective masses, the intrinsic carrier concentration is
Numerically,
For uncompensated, approximately ionized donor impurities, charge neutrality and the semiconductor mass-action law require
There is no abrupt extrinsic-to-intrinsic transition. An order-of-magnitude lower crossover density is therefore
Robust extrinsic dominance requires ; at the nominal equality, and , so intrinsic contributions are already appreciable. For a quantitative tolerance , the minimum ionized dopant density is . For example, would require at the upper temperature.
Using the nominal crossover estimate and the complete-ionization approximation at room temperature, and
For the twofold neutral-donor degeneracy, a consistency calculation gives about ionization at , raising this minority density to , about above the complete-ionization estimate. Stronger extrinsic dominance uses more donors and correspondingly fewer electron holes. Actual germanium has temperature-dependent band parameters and multiple valleys; the numerical estimate consistently uses the fixed effective data supplied rather than adding an unsupplied multiplicity.
Assume nondegenerate three-dimensional parabolic band edges, a fixed gap and approximately temperature-independent density-of-states effective masses. Let be the chemical potential, and the band edges, and their effective density of states. Boltzmann occupation gives
For one spin-degenerate spherical conduction extremum, direct integration of gives
and similarly for the valence band with its appropriate density-of-states mass. Valley and additional band degeneracies can be included in these prefactors. The factor follows from the integral .
Multiplication removes the chemical potential:
The semiconductor mass-action law combined with intrinsic charge neutrality, , therefore gives
The intrinsic chemical potential is not necessarily exactly midgap: . Equal effective masses are unnecessary for the displayed carrier-density law. A changing gap, effective mass or degeneracy would make the prefactor or activation law temperature dependent.
Assume thermal equilibrium, a three-dimensional nondegenerate semiconductor, one parabolic conduction extremum and one parabolic valence extremum, with two spin states in each. Use the supplied effective masses as scalar density-of-states parameters. With conduction energy , state counting gives the per-volume density of states
Since , replace the Fermi-Dirac distribution by its Boltzmann factor. Using and the supplied integral,
The electron hole occupation is in the valence band. Applying the same integration below gives
Their product cancels the chemical potential, giving the semiconductor mass-action law
Thus, for masses expressed in ordinary mass units,
The labels in this last box are exponents, unrelated to the magnetic field or Curie constant above. Valley degeneracy or multiple valence bands must be included in the effective density of states, or absorbed into suitable density-of-states effective masses, not counted twice. Real silicon has anisotropic multiple valleys, so its conductivity mass is not automatically its density-of-states mass; the numerical answers below implement the paper's supplied scalar-mass model.[ref]
The formula is not an identity for arbitrarily degenerate carriers. For a concrete counterexample, take while holes remain dilute. Fermi occupation gives , whereas the Boltzmann replacement would give ; the predicted product then differs by about three orders of magnitude. Separate electron and hole quasi-Fermi levels out of equilibrium would also prevent the cancellation used above.
Take uncompensated donor impurities and initially approximate them as ionized. Charge neutrality then gives , while the semiconductor mass-action law gives . Solving the quadratic without prematurely discarding minority carriers,
Since , the hole density is
Use the conduction population to locate the chemical potential:
It moves toward the conduction band but remains about below it, so the mobile electrons are nondegenerate. Despite the donor binding energy being comparable with , the large number of available conduction states makes ionization almost complete at this dilute doping. For a singly occupied two-spin donor, , with . The inferred value is , confirming the approximation to much better than one percent. Including this small correction raises the hole density only to about .
Near a parabolic valence band maximum , the missing-electron effective mass is . The same two-dimensional state counting gives
Multiplication eliminates the chemical potential, giving the semiconductor mass-action law
For an intrinsic semiconductor, charge neutrality imposes , so
The intrinsic chemical potential is not exactly midgap when the two effective masses differ: . The exponential suppression still justifies the assumed nondegenerate regime here.
With equal constant electron mobility and hole mobility , the sheet electrical conductivity is . In the intrinsic regime, , so
It decreases steeply with increasing on the high-temperature side. There is a small logarithmic curvature rather than a perfectly straight activation line.
In the fully ionized extrinsic regime, charge neutrality and the semiconductor mass-action law give , , hence
This gives a nearly horizontal region passing through . At lower temperatures semiconductor carrier freeze-out decreases the ionized donor density and bends the curve downward again.
To locate that bend realistically, include donor charge-state degeneracy. For a neutral donor with two spin states and an empty donor with one state, the ionized density is
Solve for the mobile density. In the asymptotic freeze-out regime, where is negligible and ,
Its activation scale is much smaller than the intrinsic scale .
Within the specified interval the low-temperature downturn is modest: , and the partial-ionization equation gives . The sample is not yet deep in the asymptotic freeze-out limit at 30 K. Calibrating the mobility to the stated 200 K value gives representative values
The donor statistical weights were not explicitly supplied, so they are a stated assumption for these illustrative curve details; a one-state donor approximation changes the low-temperature rounding but not the three physical regimes or their activation scales.
Figure 1.
Two-dimensional InAs conductivity from intrinsic carriers to incipient donor freeze-out
. Original ideal-model calculation using the supplied gap, masses and donor density, the derived 2D donor binding energy, twofold neutral-donor spin weight and equal temperature-independent carrier mobilities. The vertical scale is normalized to the stated 200 K conductivity. The plotted range is 30 to 600 K; donor freeze-out is only beginning at its cold end. The dashed line is the fully ionized extrinsic approximation. Details.
Let , with the Boltzmann constant, the absolute temperature, and the common equilibrium chemical potential. The conduction band minimum and valence band maximum are and ; their separation is the band gap . The positive parameters in the supplied density of states functions are the band effective masses of electrons and electron holes, not necessarily the bare electron mass.
The electron occupation is the Fermi-Dirac distribution . The appropriate statistical factors are for electrons and for electron holes. In a nondegenerate semiconductor, and , so the Boltzmann approximation gives
For the conduction band, set and then . The supplied integral yields
For the valence band, set to obtain
The effective density of states factors include the two spin states already present in the supplied density of states functions. Multiplication cancels the chemical potential and gives the semiconductor mass-action law
Here is the intrinsic carrier concentration. Equality additionally requires an electrically neutral intrinsic semiconductor. The product law also applies to an equilibrium doped semiconductor while both populations remain nondegenerate. The derivation assumes parabolic energy bands, the stated spin degeneracy, and a single common chemical potential.
There are three regimes. At the lowest temperatures, most donor impurities retain their electrons; thermal ionization gives semiconductor carrier freeze-out. The result from part (b) is
This produces the approximately straight descending low-temperature tail on the logarithmic scale plot against . The activation energy in the exponential is , because the chemical potential adjusts with donor ionization.
At intermediate temperatures, the donor impurities are essentially fully ionized while intrinsic excitation remains small. Charge neutrality gives , producing the extrinsic plateau, roughly from to in the figure.
At higher temperatures, excitation from the valence band to the conduction band creates electron-hole pairs. The intrinsic carrier concentration grows as for constant parabolic band effective masses and constant band gap. With ionized donor impurities, charge neutrality and the semiconductor mass-action law give
Thus when . This explains the renewed rapid rise and the eventual intrinsic branch; that branch is governed by the band gap, rather than the donor binding energy.
Doping changes the mobile carrier population by introducing controlled impurity levels. In an intrinsic semiconductor, the filled valence band is separated from the nearly empty conduction band by a band gap . Thermal excitation produces an electron-hole pair, so the electron and hole number densities obey . A electron hole represents a missing valence-band electron and behaves as a mobile positive charge carrier. For nondegenerate bands in thermal equilibrium,
Here are the effective density of states, the band edges, and denotes the chemical potential, conventionally called the Fermi level. The semiconductor mass-action law holds in this nondegenerate equilibrium regime.
In a tetrahedrally bonded elemental semiconductor such as silicon, a substitutional group-V atom has an extra outer electron relative to the host. It is a donor impurity: a shallow level just below can ionise, releasing an electron to the conduction band and leaving a fixed positively charged donor. The resulting n-type semiconductor has electrons as majority carriers and holes as minority carriers. Conversely a group-III substitution supplies one fewer bonding electron. An acceptor impurity can take an electron from the valence band, leaving a mobile electron hole and a fixed negative acceptor; the resulting p-type semiconductor has holes as majority carriers.
The impurity state is shallow because the electron or hole responds to a screened Coulomb potential and an effective mass, rather than the bare atomic potential. A simple hydrogenic donor estimate is
where is the relative permittivity. This is a useful scaling model, with real band anisotropy and central-cell effects omitted. Dopants are fixed in the lattice; their ionisation changes mobile carrier numbers without making a uniformly doped bulk sample carry a large net electric charge.
The charge neutrality condition is
When shallow dopants are almost fully ionised and , an n-type region has and . A p-type region similarly has and . Thus compensation by the opposite impurity type reduces the majority-carrier density; the total dopant concentration is not generally the mobile carrier density. At sufficiently high impurity density the degenerate semiconductor regime requires the full Fermi-Dirac distribution and these exponential approximations fail.
There are three useful temperature regimes. At low temperature, dopant freeze-out leaves many shallow levels un-ionised. In the extrinsic regime, the dopants are largely ionised and set the majority-carrier density. At high enough temperature, intrinsic pair creation dominates and approach . The Fermi level moves towards the conduction band with donor doping and towards the valence band with acceptor doping. The electrical conductivity is
Doping therefore controls conductivity and its carrier type, but ionised impurities also scatter carriers and can reduce charge carrier mobility. Carrier density and mobility must both be considered.
A p-n junction forms when p-type and n-type regions are joined within a semiconductor. Initially the concentration gradients drive diffusion current: electrons diffuse from the n region to the p region and holes in the opposite direction. Recombination removes mobile majority carriers near the join, exposing fixed positive donors on the n side and fixed negative acceptors on the p side. This forms a depletion region and an electric field directed from n to p. Its drift current opposes diffusion. At equilibrium the net current vanishes and the Fermi level is uniform, although the band edges vary spatially through band bending.
For an abrupt nondegenerate junction with fully ionised dopants, its built-in potential is
Under the depletion approximation, the space-charge densities are on a p-side width and on an n-side width . Integrating Poisson equation and imposing zero field outside gives and
Most of the depletion width therefore extends into the more lightly doped side. The schematic shows the impurity levels before contact and the resulting space charge and potential after contact; there is no externally extractable equilibrium battery voltage from the built-in field alone.
Figure 1.
Shallow donor and acceptor levels, and charge, field and potential in an equilibrium abrupt p-n junction
. Details.
A forward bias, with p positive relative to n, reduces the barrier from towards and injects minority carriers across the junction. In the ideal low-injection, diffusion-controlled regime this produces the Shockley diode equation, . Reverse bias increases the barrier and the depletion region; only a small thermally generated minority-carrier current flows before breakdown. Reverse-biased depletion regions also give a voltage-dependent junction capacitance. Real devices have recombination, leakage, series resistance and breakdown mechanisms beyond the ideal law. Controlled doping creates majority and minority carriers, and their junction produces a depletion barrier that makes rectification possible.
Take an abrupt equilibrium p-n junction with the p side at and the n side at . In the quasi-neutral bulk, electron holes are the majority carriers on the p side and electrons are the majority carriers on the n side. With ionized dopant densities and nondegenerate statistics,
where is the intrinsic carrier concentration. The semiconductor mass-action law applies at equilibrium. Both mobile populations are small in the depletion region compared with the dopant densities.
The charge and carrier density of an abrupt p-n junction must distinguish mobile populations from net charge. Diffusion leaves negatively charged ionized acceptor impurities on the p side and positively charged ionized donor impurities on the n side. Under the depletion approximation,
The neutral bulks have large carrier densities but nearly zero net charge density. The electric field points from the positive donor region toward the negative acceptor region, balancing diffusion at equilibrium.
Figure 1.
Illustrative equilibrium carrier densities and depletion-approximation net charge for a symmetric abrupt p-n junction
. Details.
The figure uses equal dopant densities only to show a simple symmetric sketch. Generally the more lightly doped side has the wider depleted interval. The carrier profiles are smooth, whereas the step-shaped net charge density is the ideal depletion approximation.
Semiconductor doping introduces controlled impurities to alter equilibrium carrier populations and electrical conductivity. In an intrinsic semiconductor, thermally excited electrons in the conduction band and electron holes in the valence band have equal densities . A shallow donor impurity, such as phosphorus in silicon, supplies an electron from an impurity level just below the conduction-band edge. Once ionized it is positively charged, and the material is n type. An acceptor impurity, such as boron in silicon, accepts a valence electron into a level just above the valence-band edge, leaving a mobile hole and a negatively charged ionized impurity; the material is p type.
With dopant densities , charge neutrality requires
For fully ionized, nondegenerate dopants at equilibrium, the semiconductor mass-action law gives . In a substantially n-type sample, , so
The corresponding p-type result is and . The majority population grows while the minority population decreases; adding donors does not simply add equal numbers of free electrons and holes.
The Fermi energy shifts toward the conduction band for n-type material and toward the valence band for p-type material. In the nondegenerate approximation,
where are effective band-edge state densities. At very low temperature, dopants may not be ionized and carrier freeze-out occurs. At intermediate temperatures, ionized dopants dominate the carrier density; at sufficiently high temperature, intrinsic excitation can dominate. Heavy doping can produce degenerate carrier statistics, invalidating these Boltzmann expressions.
The electrical conductivity is . Doping usually raises the majority carrier density, but ionized impurity scattering can lower mobility, so conductivity need not scale indefinitely with dopant concentration. Joining p-type and n-type regions creates a p-n junction, with a depletion region and built-in electric field established by carrier diffusion and compensating drift. The fixed ionized dopants, not an absence of all charge, account for the depleted region's net charge density.
Generation increases the mobile electron or hole populations; interband excitation creates an electron-hole pair. Thermal excitation and absorbed photons are important sources, and impact ionization can multiply carriers in a strong field. Ordinary single-photon interband absorption needs enough photon energy to bridge the band gap, with the required momentum balance.
Electron-hole recombination removes a pair. Radiative electron-hole recombination emits a photon, with simple rate ; trap-assisted electron-hole recombination uses localized defect levels and transfers energy to the lattice; Auger recombination transfers the electron-hole recombination energy to another carrier. The last process becomes especially important at high injection because its rate contains products such as and . The detailed band structure and available defects determine which channel dominates.
At thermal thermodynamic equilibrium, generation and electron-hole recombination continue at equal rates. For the simple radiative model the net electron-hole recombination rate is , enforcing the semiconductor mass-action law. Under weak excitation with the majority density nearly fixed, an excess minority density often decays as , defining its minority carrier lifetime.
A short light pulse followed by time-resolved electrical conductivity or luminescence measures the relaxation. Spatial diffusion, trapping and instrumental response must be separated from electron-hole recombination before identifying a single fitted decay constant with the intrinsic lifetime. These processes control photodetector response and light-emitting-device efficiency.
Semiconductor doping introduces electrically active impurities. In gallium arsenide, silicon has one more valence electron than gallium but one fewer than arsenic. Silicon on a gallium site can therefore supply a shallow donor electron, while silicon on an arsenic site can accept an electron and leave a mobile hole. It is an amphoteric dopant, so its net effect depends on site occupation and growth conditions.[ref]
For isotropic parabolic bands, shift the energy origin in the given free-electron density of states to the appropriate band edge and use its effective mass:
and, for valence electron states,
The stated normalization includes the two spin states and assumes one effective valley. In a nondegenerate semiconductor, the conduction occupation is approximately and the probability of a valence hole is approximately . Substituting in the first integral, and the corresponding hole energy in the second, gives
where the effective density of states values are and . The factor comes from the supplied Gaussian-weighted integral. Multiplying cancels the shared thermodynamic equilibrium chemical potential and proves the semiconductor mass-action law:
For the given sample and . With complete donor ionization and occupied acceptors, charge neutrality gives . At the given masses and gap give
Solving the compensated semiconductor equations, or using , yields
The very small minority density is consistent with the wide gap and the strongly n-type balance. Also and , checking the nondegenerate approximation. The acceptor levels are occupied in this n-type regime; complete acceptor ionization in the compensation equation is appropriate to the model.
At low temperature dopant freeze-out reduces the conduction-electron population; a quantitative curve would require dopant binding energies and occupation factors. Once donors are ionized while intrinsic excitation is negligible, gives an extrinsic plateau. At higher temperature intrinsic pairs eventually dominate, so if the gap and masses are treated as constant. Real gap and mass changes modify that last expression.
An intrinsic semiconductor has negligible electrically active impurity doping, and thermal excitation across its band gap produces equal electron and hole densities . In an extrinsic sample, semiconductor doping supplies donor impurities or acceptor impurities, so one carrier species dominates over a range of temperatures. Doping does not remove the possibility of low-temperature dopant freeze-out or high-temperature intrinsic behavior.
Assume parabolic isotropic band edges, spin degeneracy two, a single valley, thermal equilibrium and nondegenerate carriers. Write for the Fermi level, and measure conduction-band energy by . Counting momentum states gives the density of states per unit volume
The low-occupation Maxwell–Boltzmann statistics gives
The substitution and give the coefficient. Similarly and . Multiplication eliminates , proving the semiconductor mass-action law
Here the supplied effective masses are treated as the masses entering the effective density of states. A detailed multivalley silicon model would require the appropriate valley degeneracy and density-of-states masses consistently; adding an extra factor without changing the stated model would alter the requested expression.
A pentavalent arsenic impurity supplies a weakly bound excess electron. In the hydrogenic donor state approximation, dielectric screening reduces the Coulomb attraction and the band effective mass replaces the free mass. Hence the donor binding energy is
This is the effective-mass estimate, without a material-specific central-cell correction.
For the temperature plot use donor density and no acceptors. The charge neutrality with partial donor ionization model puts and includes the twofold spin degeneracy of an occupied donor:
These equations give three regimes. At low temperature, is negligible and strong dopant freeze-out gives . At intermediate temperature, the donors are almost ionized and intrinsic holes remain rare, so . At high temperature, . Thus the log-density plot against inverse temperature has a steep intrinsic segment on the left, a nearly horizontal extrinsic plateau, and a freeze-out decline on the right; the and factors give slight curvature.
Figure 1.
Carrier freeze-out, extrinsic plateau and intrinsic excitation in the specified donor model
. Original charge-neutral calculation using , constant , the supplied single-valley effective masses and donor degeneracy factor two. Dotted lines show limiting expressions where they apply; the shaded temperature interval uses a stated ten-percent plateau tolerance. Details.
To quantify “approximately constant”, require . At , the specified model gives , and . The full neutrality equations give the ten-percent plateau interval
The lower boundary is set by donor ionization and the upper boundary by intrinsic electron-hole production. The large ratio allows substantial donor ionization even when ; using only would incorrectly exclude much of the plateau. The quoted interval depends on the chosen tolerance and the constant-gap band model, rather than being an exact measured range for arsenic-doped silicon.
Nondegenerate carrier product. Assume three-dimensional parabolic energy bands near their extrema, spin degeneracy two, and no additional uncounted valley multiplicity. Near the conduction edge, a Boltzmann approximation to the Fermi-Dirac distribution gives
Angular integration and the Gaussian radial integral yield
For valence electron holes, the empty-state probability is . Measuring electron hole kinetic energy downwards from similarly gives
The factors two count spin once in each band. Multiplying cancels the chemical potential and proves the semiconductor mass-action law:
In an intrinsic neutral semiconductor, . In a doped equilibrium semiconductor the same product holds under the stated nondegenerate assumptions, even when . Extra valleys or several valence branches must be included in the effective density-of-states factors rather than counted inconsistently.
Equilibrium junction. Put the p region on the left and the n region on the right. Before contact their majority carriers are electron holes and electrons, respectively. Diffusion initially sends electrons from n to p and electron holes from p to n. This leaves negative ionized acceptors on the p side and positive ionized donors on the n side, creating a depletion region and an electric field directed from n to p. At equilibrium this field balances diffusion, so the net electric current vanishes.
For a homojunction the gap remains constant while the conduction band and valence band edges bend downwards from p to n by . The equilibrium chemical potential is flat. Since , the electrostatic potential rises from p to n. The carrier profiles satisfy
With fully ionized nondegenerate dopants, the neutral p side has , , while the neutral n side has , . Thus the electron concentration rises across the junction and the electron hole concentration falls, with both small relative to the far-side majority densities in much of the depleted region. The ideal depletion approximation neglects these mobile populations when calculating the fixed space electric charge, but the actual equilibrium profiles are smooth.
Figure 1.
Equilibrium band bending, a flat chemical potential and complementary electron/hole profiles across a homojunction
. Details.
The built-in potential follows from these Boltzmann factors:
There is no applied terminal bias; the internal electrostatic potential variation does not contradict a constant electrochemical potential.
Opposing carrier fluxes under reverse bias. Use for the magnitude of reverse bias and for reverse electric current, as in the PDF. The junction barrier increases by . The Shockley diode equation in that orientation can be written
The reverse-directed contribution is supplied by minority electrons on the p side and minority electron holes on the n side. They reach the depletion edge by diffusion and are swept across by the built-in field. The opposing contribution is associated with majority carriers thermally crossing the barrier in the forward direction; reverse bias suppresses it by the Boltzmann factor. At zero bias detailed balance makes the two equal, while at large enough reverse bias the opposing flux becomes negligible.
In the ideal neutral-region diffusion model,
Here are minority-carrier diffusion coefficients, their diffusion lengths, and is junction area. The two terms inside this positive prefactor are the electron and electron hole contributions; both flow in the same reverse-current direction. This separates the two carrier-species contributions from the two opposing fluxes in the Shockley diode equation. Calling the saturation term a drift current refers to its passage across the depleted region, and does not eliminate the minority-carrier diffusion needed to supply it.
Reading the measured curves. At , the ideal equation gives , initially proportional to reverse electric potential difference. At , it approaches a plateau . The thermal electric potential differences at the three temperatures are about –, consistent with a rise at small reverse biases and near saturation at larger ones. Higher temperature produces a much larger plateau because thermal electron-hole excitation raises exponentially.
The lower-temperature curve has a noticeable residual electric potential difference dependence rather than a perfectly flat plateau. Depletion-region generation, surface leakage or other departures from the ideal diffusion model can contribute. The sharp upturn at the largest reverse electric potential differences is reverse breakdown, outside the unextended Shockley diode equation; the plot alone does not identify a unique microscopic breakdown mechanism. The original horizontal axis duplicates the final decade label, so a precise breakdown electric potential difference cannot be read reliably. Neither issue prevents estimating the gap from the intermediate-bias saturation region.
Band-gap estimate. Use plateau electric currents at a common intermediate reverse bias, away from both the small-bias rise and the breakdown upturn. Approximate readings are , –, and . Kelvin temperatures are required in the activation law.
For fixed effective masses, . If the remaining transport prefactor is approximately constant, extracting a semiconductor band gap from diode saturation current therefore uses
Using the widest temperature separation and the rounded readings gives
Neglecting all algebraic prefactors and fitting instead gives about . These differ by roughly , a material correction on the graph's precision scale. Thus an honest graph-based conclusion is
The nonflat low-temperature plateau, rough electric current readings, unprovided temperature dependence of , and possible gap variation prevent a more precise extraction. If depletion-region generation dominated rather than the specified mechanism, its activation slope could involve a different energy scale; the displayed estimate explicitly uses the diffusion-dominated saturation model requested here.