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A semiconductor has an electronic band gap and a conductivity strongly affected by temperature, impurities and carrier injection. Optical absorption can create mobile electrons and holes, enabling a photodiode.

The useful feature of a semiconductor is that its charge carrier population can be controlled. Semiconductor doping changes the supply of mobile electrons or electron holes; carrier injection changes their population away from thermal equilibrium. A transistor turns that control into an electronic amplifier: a small input signal controls a larger flow of supplied energy.

For a uniform semiconductor in a weak electric field, a simple drift model writes its electrical conductivity asHere $q>0$ is the elementary charge, $n,p$ are the number densities of mobile electrons and electron holes, and ${\mu }_n,{\mu }_p$ their positive charge carrier mobilities. The two contributions add because opposite electric charges drift in opposite directions and therefore carry electric current in the same direction. This model assumes fixed temperature and mobilities and omits diffusion from density gradients.

An original dimensionless example isolates the effect of carrier injection. Suppose initially $p\ll n=n_0$ and ${\mu }_n=2{\mu }_p$. Adding equal excess populations $\Delta n=\Delta p=0.1n_0$ gives $\Delta \sigma /{\sigma }_0=0.15$, even though the added electron holes remain a minority carrier population. A semiconductor can respond strongly to a small injected population without changing its underlying band gap.

A semiconductor device uses controlled populations and motion of charge carriers in a semiconductor to rectify, switch, amplify, detect or emit signals. Its behavior depends on semiconductor doping, contacts, geometry and any heterojunctions, rather than only on the bulk material.

A diode illustrates the distinction: its two-terminal current-voltage characteristic comes from carrier transport through a junction and its contacts. A field-effect transistor instead uses a gate's electric field to control a conducting channel. Measuring a device therefore requires specified biasing and temperature; a quoted bulk electrical conductivity alone does not determine its terminal response.

Semiconductor device fabrication builds electronic or optoelectronic structures by controlling the geometry, composition and interfaces of semiconductor materials. Typical steps include deposition, photolithography, etching and controlled semiconductor doping. Repeating patterned steps creates devices and their interconnections.

For a simple patterned layer, deposit material, coat it with photoresist, expose through a photomask, develop the resist and transfer the pattern by etching. Later layers require alignment to earlier ones. A useful device depends on more than resolving a small feature: defects, contamination, interface quality and electrical contact resistance also affect performance. Fabrication therefore couples materials science with measurement and process control.^[ref]

In thermal equilibrium, nondegenerate conduction electrons and valence electron holes share one chemical potential. Multiplying $n=N_c{e}^{-(E_c-\mu )/(k_{B}T)}$ by $p=N_v{e}^{-(\mu -E_v)/(k_{B}T)}$ cancels that chemical potential:This relation remains valid with semiconductor doping under the stated assumptions. Equality of the two individual densities, $n=p=n_i$, additionally requires the intrinsic neutral case. Separate electron and hole quasi-Fermi levels in nonequilibrium need not obey this equilibrium product.

With one parabolic valley and two spin states at each band edge, the prefactor multiplying $(k_{B}T{)}^3$ in the product is $4(m_c{m}_h{)}^{3/2}/(2\pi {\hslash }^2{)}^3$. Both populations must be nondegenerate; the Pauli reduction of the pinned-edge mass-action product quantifies a failure of the classical approximation.

His materials research includes semiconductor doping and electronic defects. Official profile: scholars.duke.edu/person/ttan.

Daniel Tsui, Horst Störmer and Arthur Gossard reported the effect in 1982. They grew gallium arsenide–aluminium gallium arsenide layers by molecular beam epitaxy, separating the two-dimensional electron gas from its semiconductor doping. They cut Hall bars and made indium contacts. Low-field measurements established number density and charge carrier mobility. A perpendicular magnetic field sweep measured transverse and longitudinal sheet resistivities at several temperatures. Cooling sharpened the plateau near $3h/e^2$ and the longitudinal minimum at filling factor $1/3$; integer plateaus provided an internal comparison. The longitudinal minimum remained finite at the lowest temperature: zero-temperature vanishing was unresolved. This established anomalous transport, without directly measuring excitation electric charge.^[ref]

The two readouts test different statements. A single intersection with $R_H=3R_K$ would also occur on the smooth classical relation $R_H=B/(n_{s}e)$ at $n_{s}h/(eB)=1/3$. A quantum Hall plateau instead persists over a magnetic field interval. Comparing transverse and longitudinal signals helps distinguish that plateau from a contact-placement artefact; the quantum Hall conductivity tensor inversion quantifies the contamination when longitudinal sheet resistivity is nonzero.

Later, 1997 shot noise measurements associated with quantum tunnelling at filling factor $1/3$ tested the excitation electric charge separately, finding $e/3$. That is a different observable from a Hall plateau.^[ref]

A tunnel diode is a p-n junction with sufficiently heavy semiconductor doping on both sides to make a thin depletion region and permit substantial interband tunnelling. The neutral regions are degenerate semiconductors. Its distinctive forward current-voltage characteristic contains a peak followed by a valley: over part of the curve, increasing the applied electric potential difference decreases the electric current. The Esaki tunnel-diode experiment made this behavior experimentally concrete.

The useful quantity is the local slope, not the ratio of total voltage to total electric current. With conventional electric current $I$ entering the positive-voltage terminal, defineNegative differential resistance means $g_d<0$, hence $r_d<0$ where defined. A forward operating point can still have $V>0$, $I>0$ and absorbed power $VI>0$. A small voltage increase then gives a negative current increment; this does not make the total electric current negative or turn the device into an unlimited source of energy. The external supply sets the operating point and supplies the energy available for an electronic amplifier.

An original idealized construction explains the shape. Put the n-type semiconductor on the left and the p-type semiconductor on the right. Take $q>0$ as the elementary charge and $V=V_p-V_n$. Increasing forward bias lowers the right-hand electron energy levels relative to the left. Denote the two reservoir electrochemical potentials by ${\mu }_n,{\mu }_p$, so that ${\mu }_n-{\mu }_p=qV$. At zero temperature, occupied left-hand conduction band states extend up to ${\mu }_n$; empty right-hand valence band states start at ${\mu }_p$. For transfer conserving electron energy, the available interval isIt is nonempty only when its upper endpoint exceeds its lower endpoint. Both an occupied initial quantum state and an empty final quantum state must exist at the same energy. The Pauli exclusion principle prevents transfer into an already occupied final quantum state.

For the original diagram, choose arbitrary energy units with $E_{c,n}=-0.5$, ${\mu }_n=0$, ${\mu }_p=-u$ and $E_{v,p}=0.5-u$, where $u$ is $qV$ in those units. The available interval has widthThus $L(0.25)=0.25$, $L(0.50)=0.50$, $L(0.70)=0.30$, and $L(1.15)=0$. Initially forward bias opens a transfer window; further forward bias closes it by moving the right-hand valence band edge below the left-hand conduction band edge. This is a state-counting illustration, not a formula for a measured electric current.

For reverse bias, the transfer direction changes: occupied right-hand valence band states can feed empty left-hand conduction band states. In the same construction, $u=-0.70$ opens the interval $0<E<0.70$ for this reverse transfer. A narrow depletion region allows a large reverse quantum tunnelling electric current at small electric potential difference, whereas the ordinary Shockley diode equation predicts only a small reverse saturation electric current before diode reverse breakdown. At zero biasing, equal reservoir occupations give zero net electric current; quantum tunnelling does not require a net equilibrium flow.

A finite-temperature refinement replaces sharp occupation cutoffs with the Fermi-Dirac distribution. An illustrative weak-transfer expression isHere $\mathcal{W}\ge 0$ describes allowed initial/final quantum states and their coupling, and $f_n,f_p$ are Fermi-Dirac distributions with the respective electrochemical potentials. The occupation difference follows by subtracting the reverse transfer factor from the forward one: $f_n(1-f_p)-f_p(1-f_n)=f_n-f_p$. An overlap interval alone does not determine $\mathcal{W}$: transmission probability, density of states, crystal momentum selection and phonons can matter. A complete germanium calculation is more demanding than multiplying two constant density of states factors. At larger forward bias, ordinary carrier injection and diffusion supply a rising current branch even after direct band overlap is lost.