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A semiconductor whose mobile charge carrier population requires Fermi-Dirac statistics rather than a dilute Maxwell-Boltzmann distribution. In a strongly degenerate n-type semiconductor, the Fermi level lies inside the conduction band; in a strongly degenerate p-type semiconductor, it lies inside the valence band. The occupied and empty quantum states on opposite sides of a tunnel diode can then overlap in energy. Heavy semiconductor doping both changes these occupations and narrows the depletion region; a narrow barrier and accessible final quantum states serve different roles.

For a p-n junction, biasing with the p-type semiconductor at positive electric potential difference relative to the n-type semiconductor.

Isamu Akasaki was an electrical engineer whose research helped establish gallium nitride as a material for blue and ultraviolet light-emitting diodes. Working with Hiroshi Amano and other collaborators, he pursued improvements in crystal quality and in the control of p-type and n-type semiconductor.^[ref]

The scientific motivation follows from photon energy: shorter visible wavelengths require larger transition energies. A sufficiently wide band gap is therefore necessary for blue emission, but it does not by itself produce a useful device. The material must also support carrier injection and efficient light emission. High-quality growth and an operating p-n junction turned those physical requirements into an engineering platform for full-colour displays and lighting.^[ref]

The less abundant mobile charge carrier species: electron holes in an n-type semiconductor, or electrons in a p-type semiconductor. A small equilibrium population does not imply an unimportant role in an operating transistor.

An n-type semiconductor has more mobile electrons than electron holes. The letter describes the predominant mobile charge carriers, not a net negative electric charge of the whole material.

Substitutional arsenic has one more valence electron than germanium, so it acts as a donor impurity. Thermal ionization of its shallow bound state supplies mobile conduction-band electrons and leaves fixed positive donor charge. The resulting n-type semiconductor can have $n_e\gg n_i$ even when only a small fraction of host atoms are replaced. Its electrical conductivity then rises because the mobile carrier count increases; the opposite donor charge preserves macroscopic charge neutrality.

This argument assumes that the donors are substantially ionized at the measurement temperature and that the added impurity scattering does not overwhelm the carrier increase. The screened bound-donor picture and its departures from a simple hydrogenic model are described in institutional semiconductor spectroscopy notes.^[ref]

In a weakly doped n-type semiconductor, the mobile electrons occupy states near the bottom of the conduction band. Their local band curvature is positive, so their band effective mass is positive and approximately constant sufficiently near that minimum. For the usual $\beta <0$ convention, expand about $k=0$:Stronger overlap gives larger $|\beta |$, greater curvature and a smaller mass within this model. Positive $\beta$ simply places the minimum at the zone boundary and again gives a positive edge mass. A negative electron mass near a band maximum instead motivates the positive-mass electron hole description; it is not the usual conduction-edge situation for an n-type semiconductor. No numerical comparison with $m_e$ follows without values of $a$ and $\beta$.

The ambient-temperature Fermi level is raised into the upper part of the gap, toward the conduction-band edge, relative to intrinsic silicon. The sample is an n-type semiconductor: ionized donors supply many more conduction electrons than the intrinsic population.

For a nondegenerate, substantially ionized sample with negligible acceptors, $n\simeq N_D$. With effective density of states $N_c$, the conduction-band relation givesBecause a few ppm normally gives $N_D\ll N_c$ at ambient temperature, the chemical potential remains below the conduction-band edge rather than entering it as in a strongly degenerate semiconductor. Its precise position requires the dopant density, density of states and degree of ionization; the broad qualitative shift is fixed by donor doping.

It is not necessary for $\mu$ to lie between the donor level and the conduction edge. In a substantially ionized nondegenerate sample, the chemical potential can lie below the shallow donor level, as in the illustrative diagram. Donor ionization is determined by the level's occupation relative to $\mu$; a finite-temperature Fermi level is not the highest filled one-electron level of every individual configuration.

Three routes are donor doping, acceptor doping and above-gap illumination. All increase mobile carrier populations if the added states or excitations are effective rather than strongly trapped.

An appropriate donor impurity provides an occupied level just below the conduction band. Thermal ionization requires the smaller donor binding energy rather than the full host gap, supplying mobile electrons and n-type semiconductor behaviour. An appropriate acceptor impurity creates an available level just above the valence band; accepting a valence electron leaves a mobile hole, giving p-type semiconductor behaviour. Doping concentrations and compensation must permit useful carriers; an arbitrary impurity need not be an effective dopant.

For photoconductivity, absorbed photons with $h\nu \gtrsim E_g$ can excite valence electrons into the conduction band, producing electron–hole pairs. For the stated $2.7\mathrm{eV}$ gap, the nominal threshold is about $1240/2.7\simeq 459$ nm. Optical selection rules and absorption strength can shift the practical onset. The conductivity increase persists only while generation maintains carriers against recombination and trapping; it is not necessarily a permanent change to the material.

In each case, $\sigma =e(n{\mu }_n+p{\mu }_p)$ connects increased carrier density to conductivity. Defect-induced reductions in mobility can offset some of the gain, so the diagrams specify mechanisms rather than guarantee a numerical improvement for an unspecified preparation.

Sulfur substituting for phosphorus acts as a donor impurity, giving n-type semiconductor behaviour and usually increasing electrical conductivity. A P site normally supplies five valence electrons; S supplies six. After forming the surrounding bonds, the extra electron can occupy a donor level below the conduction band and be thermally ionized into that band. The donor impurity then carries positive charge.

This assignment is supported experimentally: infrared transmission measurements on S-doped gallium phosphide resolved bound-donor transitions and determined a sulfur donor optical ionization energy of about $0.104\mathrm{eV}$, far smaller than the host band gap.^[ref]

The effect depends on substitution on P sites, donor ionization, compensation by acceptors and charge carrier mobility. A dilute active donor population increases the electron term in $\sigma =e(n{\mu }_n+p{\mu }_p)$; not every dopant must donate a mobile electron at room temperature. Sulfur's larger Allen electronegativity does not overturn this electron-counting argument or make a P-site sulfur atom an acceptor.

A substitutional group-V atom such as phosphorus has one more valence electron than germanium and acts as a donor impurity, giving an n-type semiconductor. Approximate its outer electron by a hydrogenic donor state with screened Coulomb attraction and effective mass $m_e^{\ast }$. The ionization energy is the positive binding-energy magnitudeIts effective Bohr radius of a hydrogenic donor is about $3.80\mathrm{nm}$, much larger than an atomic core, consistent with a shallow extended bound state.

At $300\mathrm{K}$, $k_{B}T=25.9\mathrm{meV}$, while the mean three-dimensional classical translational kinetic energy is $3k_{B}T/2=38.8\mathrm{meV}$. Both exceed the donor binding energy, so substantial thermal ionization is expected, unlike excitation across the much larger $0.661\mathrm{eV}$ host band gap. A precise ionized fraction also depends on the chemical potential, dopant density and donor charge-state degeneracy; comparing two energy scales alone does not prove complete ionization at arbitrary concentration.

An intrinsic semiconductor has its carrier populations set primarily by thermal excitation across the band gap; in the ideal pure, neutral case its conduction-electron and hole densities are equal, $n=p=n_i$. An extrinsic semiconductor has carrier populations significantly controlled by donor or acceptor impurities, producing predominantly n-type semiconductor or p-type semiconductor behavior. Chemical purity alone does not fix conductivity independently of temperature and gap size.

The positive charge carrier mobility is the magnitude of mean drift speed per unit weak electric field. For electrons ${\mathbf{v}}_e=-{\mu }_e\mathbf{E}$, for holes ${\mathbf{v}}_h={\mu }_h\mathbf{E}$, and its SI unit is ${\mathrm{m}}^2{\mathrm{V}}^{-1}{\mathrm{s}}^{-1}$. In an isotropic relaxation-time model, $\mu =|q|\tau /m^{\ast }$.

A band effective mass characterizes how an electron wave packet accelerates in an energy band, rather than replacing its vacuum rest mass. In one dimension and its tensor generalization,These follow by differentiating $v_i={\hslash }^{-1}\partial E/\partial k_i$ and using $\hslash {\dot{k}}_j=F_j$. Effective masses can be anisotropic and electron band curvature can be negative.

A forward-biased p-n junction injects electrons from its n-type semiconductor and electron holes from its p-type semiconductor into an active region. A direct band gap allows radiative transitions without a compensating phonon, so stimulated emission can compete effectively with nonradiative processes. At thermal equilibrium there is one Fermi level; forward injection instead establishes separate electron and valence-electron quasi-Fermi levels $F_c$ and $F_v$. Sufficient injection makes conduction states more occupied than the corresponding valence states, producing optical gain.

Two parallel cleaved facets supply an optical resonator. At normal incidence their approximate intensity reflectance follows the Fresnel equations:A resonant normal mode grows when its round-trip amplification exceeds its losses. For length $L$, material optical gain $g$, overlap factor $\Gamma$, internal intensity loss ${\alpha }_i$ and facet reflectances $R_1,R_2$,The pump supplies the emitted energy; the facets provide feedback and let some output escape. Positive optical gain alone does not establish laser threshold.

Donor doping supplies conduction electrons to n-type semiconductor; acceptor doping supplies holes to p-type semiconductor. In the nondegenerate, fully ionized limit, majority densities are approximately $n_n=N_D$ and $p_p=N_A$, while minority densities follow $np=n_i^2$. On contact, majority carriers diffuse across the junction, exposing positive donor ions on the n side and negative acceptor ions on the p side. The depletion-region electric field points from n to p and opposes further diffusion. At thermal equilibrium the Fermi level is uniform and drift balances diffusion, with no net current.

For an abrupt junction with uniform doping and permittivity ${\epsilon }_s$, charge neutrality gives $N_D{x}_n=N_A{x}_p$. Poisson's equation then givesPositive applied $V$ means forward bias: it lowers the barrier and narrows the depletion region. Most depletion width lies in the more lightly doped side. The formula assumes the depletion approximation and fails once its operating assumptions break down.

forward bias increases minority densities at the depletion edges by the factor $e^{qV/k_{B}T}$. In the neutral material, the steady diffusion–recombination equation gives exponentially decaying excess minorities, with lengths $L_n=\sqrt{D_n{\tau }_n}$ and $L_p=\sqrt{D_p{\tau }_p}$. Taking the carrier gradients at the junction yieldsThis ideal diode law assumes low injection, nondegenerate statistics, negligible depletion-region recombination and series resistance, and sufficiently long neutral regions. Its exponential comes from the bias-dependent injection barrier; there is no universal abrupt “turn-on” voltage. reverse bias suppresses injection, giving an approximate $-I_S$ current until additional leakage or breakdown matters.^[ref]

Rectification uses the asymmetric current-voltage characteristic; controlled reverse breakdown enables voltage references, with current limiting. Bias-dependent depletion capacitance enables varactors. photodiodes and solar cells collect optically generated carriers through the junction field and diffusion toward it; efficient light-emitting diodes use radiative electron–hole recombination, preferably in a direct-gap material. Series resistance, high injection, trap-assisted recombination, heating and finite carrier storage explain departures from the ideal steady-state law.

Semiconductor doping introduces impurities with levels close to the band edges. A donor impurity can release an electron to the conduction band, leaving a fixed positive ion; an n-type semiconductor has electrons as majority carriers. An acceptor impurity can take an electron from the valence band, leaving a mobile hole and fixed negative ion; a p-type semiconductor has holes as majority carriers. The opposite species remains as a minority carrier population, and a neutral bulk sample balances the ionised dopants with mobile carriers.

At a p-n junction, concentration gradients initially drive electrons and holes across the join. Their removal near the join exposes negative acceptor ions on the p side and positive donor ions on the n side, forming a depletion region. Its electric field opposes further majority-carrier diffusion. Equilibrium has a flat Fermi level, no net current and spatially bent band edges. With p on the left and n on the right, the electron band edges fall towards the n side; the difference is the equilibrium barrier in electron energy. A flat Fermi level does not mean flat conduction and valence edges.

Doping changes the mobile carrier population by introducing controlled impurity levels. In an intrinsic semiconductor, the filled valence band is separated from the nearly empty conduction band by a band gap $E_g$. Thermal excitation produces an electron-hole pair, so the electron and hole number densities obey $n=p=n_i$. A electron hole represents a missing valence-band electron and behaves as a mobile positive charge carrier. For nondegenerate bands in thermal equilibrium,Here $N_C,N_V$ are the effective density of states, $E_C,E_V$ the band edges, and $E_F$ denotes the chemical potential, conventionally called the Fermi level. The semiconductor mass-action law holds in this nondegenerate equilibrium regime.

In a tetrahedrally bonded elemental semiconductor such as silicon, a substitutional group-V atom has an extra outer electron relative to the host. It is a donor impurity: a shallow level just below $E_C$ can ionise, releasing an electron to the conduction band and leaving a fixed positively charged donor. The resulting n-type semiconductor has electrons as majority carriers and holes as minority carriers. Conversely a group-III substitution supplies one fewer bonding electron. An acceptor impurity can take an electron from the valence band, leaving a mobile electron hole and a fixed negative acceptor; the resulting p-type semiconductor has holes as majority carriers.

The impurity state is shallow because the electron or hole responds to a screened Coulomb potential and an effective mass, rather than the bare atomic potential. A simple hydrogenic donor estimate iswhere ${ϵ}_r$ is the relative permittivity. This is a useful scaling model, with real band anisotropy and central-cell effects omitted. Dopants are fixed in the lattice; their ionisation changes mobile carrier numbers without making a uniformly doped bulk sample carry a large net electric charge.

The charge neutrality condition isWhen shallow dopants are almost fully ionised and $N_D-N_A\gg n_i$, an n-type region has $n\simeq N_D-N_A$ and $p\simeq n_i^2/n$. A p-type region similarly has $p\simeq N_A-N_D$ and $n\simeq n_i^2/p$. Thus compensation by the opposite impurity type reduces the majority-carrier density; the total dopant concentration is not generally the mobile carrier density. At sufficiently high impurity density the degenerate semiconductor regime requires the full Fermi-Dirac distribution and these exponential approximations fail.

There are three useful temperature regimes. At low temperature, dopant freeze-out leaves many shallow levels un-ionised. In the extrinsic regime, the dopants are largely ionised and set the majority-carrier density. At high enough temperature, intrinsic pair creation dominates and $n,p$ approach $n_i$. The Fermi level moves towards the conduction band with donor doping and towards the valence band with acceptor doping. The electrical conductivity isDoping therefore controls conductivity and its carrier type, but ionised impurities also scatter carriers and can reduce charge carrier mobility. Carrier density and mobility must both be considered.

A p-n junction forms when p-type and n-type regions are joined within a semiconductor. Initially the concentration gradients drive diffusion current: electrons diffuse from the n region to the p region and holes in the opposite direction. Recombination removes mobile majority carriers near the join, exposing fixed positive donors on the n side and fixed negative acceptors on the p side. This forms a depletion region and an electric field directed from n to p. Its drift current opposes diffusion. At equilibrium the net current vanishes and the Fermi level is uniform, although the band edges vary spatially through band bending.

For an abrupt nondegenerate junction with fully ionised dopants, its built-in potential isUnder the depletion approximation, the space-charge densities are $-e{N}_A$ on a p-side width $w_p$ and $+e{N}_D$ on an n-side width $w_n$. Integrating Poisson equation and imposing zero field outside gives $N_A{w}_p=N_D{w}_n$ andMost of the depletion width therefore extends into the more lightly doped side. The schematic shows the impurity levels before contact and the resulting space charge and potential after contact; there is no externally extractable equilibrium battery voltage from the built-in field alone.

A forward bias, with p positive relative to n, reduces the barrier from $V_{\mathrm{bi}}$ towards $V_{\mathrm{bi}}-V$ and injects minority carriers across the junction. In the ideal low-injection, diffusion-controlled regime this produces the Shockley diode equation, $I=I_s[e^{eV/(k_{B}T)}-1]$. Reverse bias increases the barrier and the depletion region; only a small thermally generated minority-carrier current flows before breakdown. Reverse-biased depletion regions also give a voltage-dependent junction capacitance. Real devices have recombination, leakage, series resistance and breakdown mechanisms beyond the ideal law. Controlled doping creates majority and minority carriers, and their junction produces a depletion barrier that makes rectification possible.

Take a p-n junction made from one semiconductor, with the p-type semiconductor on the left and the n-type semiconductor on the right. At thermal equilibrium the chemical potential $\mu =E_F$ is horizontal throughout. Before contact the chemical potential lies nearer the valence band on the p side and nearer the conduction band on the n side; after contact the band edges bend to permit one common value.

In this orientation both the conduction band edge $E_C$ and the valence band edge $E_V$ decrease from p to n by $e{V}_{\mathrm{bi}}$. For a homojunction their separation $E_g=E_C-E_V$ is constant. The acceptor impurity level $E_A$ lies just above $E_V$ where acceptors are present, and the donor impurity level $E_D$ lies just below $E_C$ where donors are present. These impurity levels follow the local band bending; they do not form one additional horizontal band across the device.

The shaded depletion region has few mobile electrons or electron holes and contains fixed negative ionized acceptor impurities on the p side and positive ionized donor impurities on the n side. Thus its electric field points from n to p. Its neutral outer regions have negligible electric field, so the band edges become flat there. In the depletion approximation, charge neutrality requires $N_A{x}_p=N_D{x}_n$; the symmetric drawing illustrates $N_A=N_D$ rather than assuming that equality is universal. Diffusion and field-driven drift current cancel at equilibrium: no applied voltage does not mean zero internal electric field or zero built-in electric potential difference.

Dopant atoms and carrier type. Substitutional semiconductor doping places a small fraction of foreign atoms on host lattice sites. In a tetrahedrally bonded group-IV semiconductor, a group-V substitution such as phosphorus in silicon has an extra valence electron. A shallow donor level just below the conduction edge can release that electron, leaving a positively charged donor. In an n-type semiconductor, mobile electrons are the majority carriers and the chemical potential shifts toward the conduction band.

A group-III substitution such as boron in silicon has one fewer valence electron. An acceptor level just above the valence edge captures an electron from the valence states, leaving a mobile electron hole and a negatively charged acceptor. In a p-type semiconductor, electron holes are the majority carriers and the chemical potential shifts toward the valence band. The material can remain electrically neutral in both cases: mobile carrier electric charge is compensated by fixed ionized impurity electric charge. Dopant freeze-out, compensation and degeneracy qualify the simplest one-carrier-per-dopant picture.

Making the junction. Choose p material at $x<0$ and n material at $x>0$. Electrons initially diffuse from n to p, and electron holes from p to n, recombining near the interface. Negative ionized acceptors are exposed on the p side and positive ionized donors on the n side. They produce an electric field directed from n to p. The field opposes further majority-carrier diffusion until drift and diffusion balance and the equilibrium electrochemical potential is uniform.

The depletion regions are depleted of mobile majority carriers, not of the fixed dopant charges that create the space charge. At equilibrium the conduction and valence edges bend together, while the chemical potential is flat. The specified $\Delta {\varphi }_0$ is a electric potential difference: the corresponding initial chemical-potential energy separation is $e\Delta {\varphi }_0$. This convention is required by the quoted units and width formulas. Write ${\epsilon }_s=ϵ{ϵ}_0$ for the absolute permittivity; the paper's $ϵ$ is relative permittivity.

Poisson equation and widths. Let the depleted intervals be $-w_p<x<0$ and $0<x<w_n$. Fully ionized number densities $N_A,N_D$ correspond to electric charge densities $-e{N}_A,+e{N}_D$, respectively. ThusThe factor $e$ converts a dopant concentration to a space-charge density. Requiring zero field in both neutral regions gives charge neutrality,With $\mathcal{E}=-{\varphi }^{\prime }$, direct integration gives the triangular fieldContinuity at the interface is the same neutrality condition. The field is negative throughout the depleted interval. Set $\varphi (-w_p)=0$. Its integral givesPotential continuity therefore requiresCombining it with neutrality yields the abrupt-junction depletion width and capacitance resultsThe more lightly doped side depletes farther, because equal and opposite space charges must be exposed.

Applied bias. Define positive $V$ as forward bias, raising the p-side terminal potential relative to the n-side terminal. It lowers the remaining barrier from $\Delta {\varphi }_0$ to $\Delta {\varphi }_0-V$. Reverse bias has $V<0$ and raises that barrier. The same Poisson integration applies, with this replacement:Forward bias narrows the depleted region; reverse bias widens it. Under bias there need not be one equilibrium chemical potential across the device, so the equilibrium flat-level argument must not be reapplied unchanged. The barrier/width change is illustrated in the next figure.

Differential capacitance and electric charge sign. Put $B=\Delta {\varphi }_0-V>0$ and $N_{\mathrm{eff}}=N_A{N}_D/(N_A+N_D)$. The signed p-side fixed electric charge per unit area isDifferentiating with respect to forward electric potential difference gives the positive capacitance per unit areaThe n-side electric charge is $Q_n=-Q_p$, so $d{Q}_n/dV=-C_A$ instead. If $Q$ denotes a positive space-charge magnitude, the positive capacitance is $-dQ/dV$ for this forward-voltage convention. This resolves the sign implicit in the paper's positive $dQ/dV$. The total device capacitance is $C=\mathcal{A}{C}_A$, where $\mathcal{A}$ is its cross-sectional area.

Finite device and numerical sketch. For the symmetric device, $N_A=N_D=N$ and each side has thickness $d$. Before full depletion,Using ${\epsilon }_s=12{ϵ}_0=1.0625\times 10^{-10}\mathrm{F}{\mathrm{m}}^{-1}$, the zero-bias width on each side is $4.07\mu \mathrm{m}$, less than $d=10\mu \mathrm{m}$. The total zero-bias capacitance is $\boxed{C(0)\simeq 1.30\mathrm{pF}}$.

Full depletion occurs when $w=d$, soAt larger reverse bias the depleted thickness cannot exceed $2d$. In the ideal fully depleted slab, incremental terminal electric charge changes the field uniformly through that fixed thickness, giving the full-depletion capacitance of a symmetric junction slabThus the idealized piecewise sketch over the specified range isIt is continuous at full depletion, rises through $1.30\mathrm{pF}$ at zero bias, and has a formal inverse-square-root divergence as $V\to 0.5\mathrm{V}$ from below.

There are two physical limits to this extension. Once all dopants are exposed, their fixed space charge no longer increases, but the terminal electrodes can still acquire incremental electric charge; differentiating only the fixed ionized electric charge would incorrectly predict zero capacitance. Near $V=\Delta {\varphi }_0$, the depletion approximation itself fails as mobile carriers and forward injection become important, so the formal infinite endpoint is not a prediction of an actual infinite measured capacitance. The fully depleted plateau assumes ideal contacts and no breakdown, injection storage or extra series capacitance.

A current-carrying sample in a transverse magnetic field develops a transverse electric field because the Lorentz force deflects its charge carriers. In steady state this Hall voltage balances the transverse deflection. With Hall coefficient $R_H=E_y/(j_x{B}_z)$, one isotropic electron band gives $R_H=-1/(ne)$ and one hole band gives $R_H=+1/(pe)$.

When electrons and electron holes both conduct, the weak-field two-carrier result isThe two-carrier Hall coefficient weights each species by mobility squared. Its sign changes whenTemperature changes dopant ionization, intrinsic electron-hole generation, and the two charge carrier mobilities, so it can move the system across this condition. For example, a p-type semiconductor can be hole-dominated in its extrinsic regime but become negative in its intrinsic regime if $n\simeq p$ and ${\mu }_e>{\mu }_h$. A sign change is possible, not mandatory: in many n-type semiconductors electrons dominate at both temperatures. The density majority alone does not determine the Hall sign in a two-carrier material.

For a p-n junction, biasing with the p-type semiconductor at negative electric potential difference relative to the n-type semiconductor.