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The built-in potential of a p-n junction is the electrostatic potential difference established when carrier diffusion exposes ionized dopants until the opposing drift and diffusion currents balance. The equilibrium electrochemical potential is constant even though the electric potential and band edges vary. In a nondegenerate homojunction with neutral-edge majority densities $p_p,n_n$, $e{V}_b=k_{B}T\log (p_p{n}_n/n_i^2)$. This is band bending within the same material, not necessarily a discontinuous offset of different materials' band edges.

The depletion approximation replaces the junction's transition region by a region without mobile carriers, leaving only fixed ionized dopants. For a uniformly doped abrupt p-n junction, $\rho =-e{N}_A$ on the p side, $\rho =+e{N}_D$ on the n side and $\rho \simeq 0$ outside. Charge neutrality gives $N_A{x}_p=N_D{x}_n$. Integrating Poisson equation gives the electric field and the electrostatic band bending.

A double heterostructure laser electrically pumps its central layer for stimulated emission. Band offsets confine charge carriers; refractive index contrast confines the optical normal mode.^[ref]

For an original bookkeeping model, let $R$ be the injected pair rate per unit area, $d$ the active-layer thickness, $N$ its excess pair number density, $\tau$ a recombination lifetime, and ${\tau }_e$ an escape time. Before appreciable stimulated emission, supposeChoose two otherwise identical devices with ${\tau }_e=\tau$ and ${\tau }_e=9\tau$. The resulting steady state populations are $R\tau /(2d)$ and $9R\tau /(10d)$: improved confinement raises the population by a factor $1.8$ at fixed injection. This linear model assumes equal excess Electron and electron hole densities, fixed lifetimes, and no laser gain clamping.

Optical confinement enters separately. For a chosen optical normal mode, define $0<\Gamma \le 1$ as its gain-overlap factor with the active layer. With material optical gain $g$, internal loss ${\alpha }_i$, and mirror loss ${\alpha }_m$, a simple laser threshold condition isFor stipulated losses ${\alpha }_i+{\alpha }_m=3$ in inverse-length units, $\Gamma =1/2$ requires $g=6$, whereas $\Gamma =3/4$ requires $g=4$. This calculation varies optical overlap only; the preceding population calculation varies carrier escape only. Their combination explains the usefulness of controlling both the energy band profile and the optical normal mode.

Herbert Kroemer proposed the double heterostructure laser in 1963; he did not participate in its 1970 experimental realization.^[ref] Zhores I. Alferov describes his group's independent 1963 proposal and later experimental program.^[ref]

Consider an original one-dimensional effective mass model with $V(x)=0$ for $|x|<a$ and $V(x)=V_0>0$ outside. Take the same positive effective mass $m^{\ast }$ everywhere, an abrupt interface, and no interactions. The wavefunction represents a transverse envelope; free motion parallel to the layer is outside this calculation. A double heterostructure laser need not be thin enough for this quantization to dominate its operation.

Set $s=x/a$, $ϵ={\hslash }^2/(2m^{\ast }{a}^2)$, $z_0^2=V_0/ϵ$, $z^2=E/ϵ$ and $w=\sqrt{z_0^2-z^2}$. The time-independent Schrödinger equation becomesHere $u(s)$ denotes the dimensionless potential; a bound state has $0<z<z_0$. Matching the wavefunction and its derivative at $s=1$ givesFor the even bound state, the interior solution is $A\cos (zs)$ and the exterior solution is $A\cos z{e}^{-w(|s|-1)}$. For the odd bound state, replace $\cos (zs)$ by $\sin (zs)$ and $\cos z$ by $\mathrm{sgn}(s)\sin z$. The physical wavefunction is $\psi (x)=\varphi (x/a)/\sqrt{a}$.

Wavefunction normalization includes both exterior tails, not just the active layer. Direct integration givesThe first two terms are the interior integral; the last is the total exterior integral. Thus the interior probability is $P_{\mathrm{in}}=A^2[1\pm \sin (2z)/(2z)]$, with the upper sign for even parity.

Choose $z_0=2$. There is one even root in $(0,\pi /2)$ and one odd root in $(\pi /2,2)$; higher branches start beyond $z_0$. Each left-hand side increases on its stated interval while $\sqrt{4-z^2}$ decreases, proving uniqueness there. Numerically,These are calculated values of the chosen finite square well. The excited bound state lies closer to the barrier and has a longer exterior tail: being bound does not mean having unit probability inside the well.

This model demonstrates electronic confinement, not optical refractive index confinement or a complete laser. Unequal effective masses, band bending, interface disorder and interactions require a more detailed model. In particular, continuity of the ordinary derivative above uses the chosen constant effective mass assumption.

An ideal insulating gate blocks particle exchange between the gate and substrate of a MOSFET. Their electrochemical potentials, represented by their band-diagram Fermi levels, therefore need not coincide. An applied gate voltage fixes their difference; with $e>0$ and voltage defined by an electron reservoir, ${\tilde{\mu }}_g-{\tilde{\mu }}_s=-e{V}_g$. Contact work-function differences also affect band bending, so equal Fermi levels do not imply flat bands. Each conducting region can separately have a spatially constant equilibrium electrochemical potential.

A homojunction joins regions of the same semiconductor material with different semiconductor doping. Its bulk band gap is the same on both sides. This distinguishes the electrostatic band bending of a simple equilibrium p-n junction from the material-dependent band offsets possible in a heterojunction.

An impurity level is an electronic energy level associated with a dopant or defect in a semiconductor. A shallow donor impurity introduces a level just below the conduction band, and a shallow acceptor impurity introduces one just above the valence band. Under electrostatic band bending, these levels shift with the local band edges in the same material; their occupation is determined relative to the equilibrium chemical potential.

Doping changes the mobile carrier population by introducing controlled impurity levels. In an intrinsic semiconductor, the filled valence band is separated from the nearly empty conduction band by a band gap $E_g$. Thermal excitation produces an electron-hole pair, so the Electron and hole number densities obey $n=p=n_i$. A electron hole represents a missing valence-band Electron and behaves as a mobile positive charge carrier. For nondegenerate bands in thermal equilibrium,Here $N_C,N_V$ are the effective density of states, $E_C,E_V$ the band edges, and $E_F$ denotes the chemical potential, conventionally called the Fermi level. The semiconductor mass-action law holds in this nondegenerate equilibrium regime.

In a tetrahedrally bonded elemental semiconductor such as silicon, a substitutional group-V atom has an extra outer Electron relative to the host. It is a donor impurity: a shallow level just below $E_C$ can ionise, releasing an Electron to the conduction band and leaving a fixed positively charged donor. The resulting n-type semiconductor has Electrons as majority carriers and holes as minority carriers. Conversely a group-III substitution supplies one fewer bonding Electron. An acceptor impurity can take an Electron from the valence band, leaving a mobile electron hole and a fixed negative acceptor; the resulting p-type semiconductor has holes as majority carriers.

The impurity state is shallow because the Electron or hole responds to a screened Coulomb potential and an effective mass, rather than the bare atomic potential. A simple hydrogenic donor estimate iswhere ${ϵ}_r$ is the relative permittivity. This is a useful scaling model, with real band anisotropy and central-cell effects omitted. Dopants are fixed in the lattice; their ionisation changes mobile carrier numbers without making a uniformly doped bulk sample carry a large net electric charge.

The charge neutrality condition isWhen shallow dopants are almost fully ionised and $N_D-N_A\gg n_i$, an n-type region has $n\simeq N_D-N_A$ and $p\simeq n_i^2/n$. A p-type region similarly has $p\simeq N_A-N_D$ and $n\simeq n_i^2/p$. Thus compensation by the opposite impurity type reduces the majority-carrier density; the total dopant concentration is not generally the mobile carrier density. At sufficiently high impurity density the degenerate semiconductor regime requires the full Fermi-Dirac distribution and these exponential approximations fail.

There are three useful temperature regimes. At low temperature, dopant freeze-out leaves many shallow levels un-ionised. In the extrinsic regime, the dopants are largely ionised and set the majority-carrier density. At high enough temperature, intrinsic pair creation dominates and $n,p$ approach $n_i$. The Fermi level moves towards the conduction band with donor doping and towards the valence band with acceptor doping. The electrical conductivity isDoping therefore controls conductivity and its carrier type, but ionised impurities also scatter carriers and can reduce charge carrier mobility. Carrier density and mobility must both be considered.

A p-n junction forms when p-type and n-type regions are joined within a semiconductor. Initially the concentration gradients drive diffusion current: Electrons diffuse from the n region to the p region and holes in the opposite direction. Recombination removes mobile majority carriers near the join, exposing fixed positive donors on the n side and fixed negative acceptors on the p side. This forms a depletion region and an electric field directed from n to p. Its drift current opposes diffusion. At equilibrium the net current vanishes and the Fermi level is uniform, although the band edges vary spatially through band bending.

For an abrupt nondegenerate junction with fully ionised dopants, its built-in potential isUnder the depletion approximation, the space-charge densities are $-e{N}_A$ on a p-side width $w_p$ and $+e{N}_D$ on an n-side width $w_n$. Integrating Poisson equation and imposing zero field outside gives $N_A{w}_p=N_D{w}_n$ andMost of the depletion width therefore extends into the more lightly doped side. The schematic shows the impurity levels before contact and the resulting space charge and potential after contact; there is no externally extractable equilibrium battery voltage from the built-in field alone.

A forward bias, with p positive relative to n, reduces the barrier from $V_{\mathrm{bi}}$ towards $V_{\mathrm{bi}}-V$ and injects minority carriers across the junction. In the ideal low-injection, diffusion-controlled regime this produces the Shockley diode equation, $I=I_s[e^{eV/(k_{B}T)}-1]$. Reverse bias increases the barrier and the depletion region; only a small thermally generated minority-carrier current flows before breakdown. Reverse-biased depletion regions also give a voltage-dependent junction capacitance. Real devices have recombination, leakage, series resistance and breakdown mechanisms beyond the ideal law. Controlled doping creates majority and minority carriers, and their junction produces a depletion barrier that makes rectification possible.

Take a p-n junction made from one semiconductor, with the p-type semiconductor on the left and the n-type semiconductor on the right. At thermal equilibrium the chemical potential $\mu =E_F$ is horizontal throughout. Before contact the chemical potential lies nearer the valence band on the p side and nearer the conduction band on the n side; after contact the band edges bend to permit one common value.

In this orientation both the conduction band edge $E_C$ and the valence band edge $E_V$ decrease from p to n by $e{V}_{\mathrm{bi}}$. For a homojunction their separation $E_g=E_C-E_V$ is constant. The acceptor impurity level $E_A$ lies just above $E_V$ where acceptors are present, and the donor impurity level $E_D$ lies just below $E_C$ where donors are present. These impurity levels follow the local band bending; they do not form one additional horizontal band across the device.

The shaded depletion region has few mobile Electrons or electron holes and contains fixed negative ionized acceptor impurities on the p side and positive ionized donor impurities on the n side. Thus its electric field points from n to p. Its neutral outer regions have negligible electric field, so the band edges become flat there. In the depletion approximation, charge neutrality requires $N_A{x}_p=N_D{x}_n$; the symmetric drawing illustrates $N_A=N_D$ rather than assuming that equality is universal. Diffusion and field-driven drift current cancel at equilibrium: no applied voltage does not mean zero internal electric field or zero built-in electric potential difference.

A positive electric potential difference between gate and substrate attracts Electrons towards the insulating interface and repels the mobile electron holes of the p-type semiconductor substrate. The exposed, negatively charged acceptor impurities form a depletion region; the thin mobile Electron layer at its surface is the semiconductor inversion layer. The conduction band and valence band bend downwards towards the positively biased gate, because the Electron potential energy is $-e\psi$.

To specify the conventional MOS inversion threshold, let $N_A$ be the ionized acceptor density, $n_i$ the intrinsic carrier concentration, andIn the neutral bulk the intrinsic level lies $e{\varphi }_F$ above the semiconductor chemical potential. A positive surface potential ${\psi }_s$ lowers both band edges by $e{\psi }_s$, giving, in the nondegenerate approximation,At ${\psi }_s={\varphi }_F$, the surface is intrinsic: $n_s=p_s=n_i$. The usual onset of strong inversion instead meansThus the surface electron density has grown to the bulk majority-carrier density. The chemical potential need not actually enter the conduction band. The phrase “just forms” can also refer to the earlier weak-inversion crossover; the diagram uses the conventional strong-inversion threshold and labels it explicitly.

Within the depletion approximation the negative space charge is approximately $-e{N}_A$ over a widthwhere ${ϵ}_s$ is the absolute semiconductor permittivity. Its outer edge is where the bands become flat and mobile electron holes recover their bulk density. The electrical insulator blocks steady carrier transport while sustaining an electric field; the metal gate supplies positive surface charge balancing depletion and inversion charge. Under gate bias, the gate and substrate electrochemical potentials are different, so a single equilibrium Fermi level should not be drawn through the whole biased stack.

A positive gate voltage attracts Electrons towards the oxide interface of the p-type semiconductor and repels mobile electron holes. The uncovered ionized acceptors form a negatively charged depletion region. Increasing the voltage further creates a thin electron-rich semiconductor inversion layer at the surface. The conduction band and valence band both bend downwards towards the positively biased gate, because an electron's electrostatic energy is $-e\psi$.

In an ideal nondegenerate substrate with acceptor density $N_A$, write ${\varphi }_F=(k_{B}T/e)\ln (N_A/n_i)>0$ and surface potential ${\psi }_s$ relative to the neutral bulk. The electron and hole surface densities areThe first change of majority-carrier type occurs at ${\psi }_s={\varphi }_F$, where $n_s=p_s=n_i$. The conventional MOS inversion threshold for appreciable strong inversion isAt threshold the inversion sheet is just developing, while a much thicker depletion region lies between it and the neutral p-type bulk. Inversion does not require the conduction band to cross the Fermi level: the surface can remain nondegenerate.

The metal and semiconductor Fermi levels need not be equal. The ideal oxide blocks particle exchange, so the gate and substrate can maintain different electrochemical potentials. In a biased MOSFET, the gate-to-substrate Fermi-level difference is ${\tilde{\mu }}_g-{\tilde{\mu }}_s=-e{V}_g$, when the applied voltage is defined in the electron-reservoir convention. Each region can separately be in internal equilibrium. If an external zero-voltage connection instead equilibrates the reservoirs, their Fermi levels coincide, but different work functions can still cause band bending. Here the chemical potential shown in a band diagram is the electron electrochemical potential; the purely chemical contribution alone is not the equilibrium criterion for charged particles.

At equilibrium, majority Electrons undergo diffusion from n to p, while majority electron holes diffuse from p to n. Their departure exposes positive donors on the n side and negative acceptors on the p side. The resulting electric field points from n to p and opposes further diffusion. Equilibrium is reached when the chemical potential is constant across the junction. The built-in potential is this electrostatic adjustment, not a discontinuity of the material's band gap.

Since electronic band energies shift by $-eV(x)$, both the conduction band and valence band undergo band bending down from p to n by $e{V}_b$ at zero applied bias. Their separation remains the same gap. In the nondegenerate thermal equilibrium limit the built-in voltage can also be expressed using neutral-edge densities as $e{V}_b=k_{B}T\log (n_n/n_p)=k_{B}T\log (n_n{p}_p/n_i^2)$.

Take the n-contact potential and its electrochemical potential as reference. Applying $V_{\mathrm{ext}}$ to the p side changes the total depletion-layer drop toThus $V_{\mathrm{ext}}<0$ is reverse bias: it increases the barrier and widens the depletion region. The bands have horizontal tangents at the neutral edges in this approximation and a smooth cubic bend within the linearly graded layer.

A biased junction is not in global thermal equilibrium. Its contact electron electrochemical potentials obeyUnder reverse bias the p-contact level is higher by $e|V_{\mathrm{ext}}|$. A single horizontal equilibrium chemical potential cannot describe this state; electron and hole quasi-Fermi levels describe the nonequilibrium populations. The sketch marks the contact levels. Detailed spatial quasi-Fermi profiles require transport and recombination information beyond the electrostatic doping profile.

A surface state is an electronic state localized near a material boundary. Its occupation can store electric charge and change the near-surface electric potential, producing band bending.

Walter Houser Brattain's surface studies combined changes of contact potential under light, electrical conductivity, and transient response to distinguish surface effects from bulk properties. His Nobel lecture distinguishes fast and slow charge responses and warns that slow behavior can involve the surrounding gas rather than a simple electronic state.^[ref]

A tunnel diode is a p-n junction with sufficiently heavy semiconductor doping on both sides to make a thin depletion region and permit substantial interband tunnelling. The neutral regions are degenerate semiconductors. Its distinctive forward current-voltage characteristic contains a peak followed by a valley: over part of the curve, increasing the applied electric potential difference decreases the electric current. The Esaki tunnel-diode experiment made this behavior experimentally concrete.

The useful quantity is the local slope, not the ratio of total voltage to total electric current. With conventional electric current $I$ entering the positive-voltage terminal, defineNegative differential resistance means $g_d<0$, hence $r_d<0$ where defined. A forward operating point can still have $V>0$, $I>0$ and absorbed power $VI>0$. A small voltage increase then gives a negative current increment; this does not make the total electric current negative or turn the device into an unlimited source of energy. The external supply sets the operating point and supplies the energy available for an electronic amplifier.

An original idealized construction explains the shape. Put the n-type semiconductor on the left and the p-type semiconductor on the right. Take $q>0$ as the elementary charge and $V=V_p-V_n$. Increasing forward bias lowers the right-hand Electron energy levels relative to the left. Denote the two reservoir electrochemical potentials by ${\mu }_n,{\mu }_p$, so that ${\mu }_n-{\mu }_p=qV$. At zero temperature, occupied left-hand conduction band states extend up to ${\mu }_n$; empty right-hand valence band states start at ${\mu }_p$. For transfer conserving Electron energy, the available interval isIt is nonempty only when its upper endpoint exceeds its lower endpoint. Both an occupied initial quantum state and an empty final quantum state must exist at the same energy. The Pauli exclusion principle prevents transfer into an already occupied final quantum state.

For the original diagram, choose arbitrary energy units with $E_{c,n}=-0.5$, ${\mu }_n=0$, ${\mu }_p=-u$ and $E_{v,p}=0.5-u$, where $u$ is $qV$ in those units. The available interval has widthThus $L(0.25)=0.25$, $L(0.50)=0.50$, $L(0.70)=0.30$, and $L(1.15)=0$. Initially forward bias opens a transfer window; further forward bias closes it by moving the right-hand valence band edge below the left-hand conduction band edge. This is a state-counting illustration, not a formula for a measured electric current.

For reverse bias, the transfer direction changes: occupied right-hand valence band states can feed empty left-hand conduction band states. In the same construction, $u=-0.70$ opens the interval $0<E<0.70$ for this reverse transfer. A narrow depletion region allows a large reverse quantum tunnelling electric current at small electric potential difference, whereas the ordinary Shockley diode equation predicts only a small reverse saturation electric current before diode reverse breakdown. At zero biasing, equal reservoir occupations give zero net electric current; quantum tunnelling does not require a net equilibrium flow.

A finite-temperature refinement replaces sharp occupation cutoffs with the Fermi-Dirac distribution. An illustrative weak-transfer expression isHere $\mathcal{W}\ge 0$ describes allowed initial/final quantum states and their coupling, and $f_n,f_p$ are Fermi-Dirac distributions with the respective electrochemical potentials. The occupation difference follows by subtracting the reverse transfer factor from the forward one: $f_n(1-f_p)-f_p(1-f_n)=f_n-f_p$. An overlap interval alone does not determine $\mathcal{W}$: transmission probability, density of states, crystal momentum selection and phonons can matter. A complete germanium calculation is more demanding than multiplying two constant density of states factors. At larger forward bias, ordinary carrier injection and diffusion supply a rising current branch even after direct band overlap is lost.